High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …

The recent development in the field of superhard materials with Vickers hardness of⩾ 40
GPa is reviewed. Two basic approaches are outlined including the intrinsic superhard …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

An extended structure zone diagram is proposed that includes energetic deposition,
characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high …

Atomic-scale control and manipulation of the microstructure of polycrystalline thin films
during kinetically limited low-temperature deposition, crucial for a broad range of industrial …

The influence on thin film density using high power impulse magnetron sputtering (HiPIMS)
has been investigated for eight different target materials (Al, Ti, Cr, Cu, Zr, Ag, Ta, and Pt) …

The maturation of nanotechnology has revealed it to be a unique and distinct discipline
rather than a specialization within a larger field. Its textbook cannot afford to be a chemistry …

High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized
physical vapor deposition technique and is already making its way to industrial applications …

Biaxially aligned thin films have not only a preferential crystallographic out-of-plane
orientation, but also have an alignment along a certain reference direction parallel to the …