High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …
gained substantial interest among academics and industrials alike. HPPMS, also known as …
The search for novel, superhard materials
S Vepřek - Journal of Vacuum Science & Technology A: Vacuum …, 1999 - pubs.aip.org
The recent development in the field of superhard materials with Vickers hardness of⩾ 40
GPa is reviewed. Two basic approaches are outlined including the intrinsic superhard …
GPa is reviewed. Two basic approaches are outlined including the intrinsic superhard …
Physics and technology of magnetron sputtering discharges
JT Gudmundsson - Plasma Sources Science and Technology, 2020 - iopscience.iop.org
Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …
of both metallic and compound thin films and is utilized in numerous industrial applications …
High power impulse magnetron sputtering discharge
The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …
A structure zone diagram including plasma-based deposition and ion etching
A Anders - Thin Solid Films, 2010 - Elsevier
An extended structure zone diagram is proposed that includes energetic deposition,
characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high …
characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high …
Microstructural evolution during film growth
Atomic-scale control and manipulation of the microstructure of polycrystalline thin films
during kinetically limited low-temperature deposition, crucial for a broad range of industrial …
during kinetically limited low-temperature deposition, crucial for a broad range of industrial …
On the film density using high power impulse magnetron sputtering
M Samuelsson, D Lundin, J Jensen, MA Raadu… - Surface and Coatings …, 2010 - Elsevier
The influence on thin film density using high power impulse magnetron sputtering (HiPIMS)
has been investigated for eight different target materials (Al, Ti, Cr, Cu, Zr, Ag, Ta, and Pt) …
has been investigated for eight different target materials (Al, Ti, Cr, Cu, Zr, Ag, Ta, and Pt) …
[КНИГА][B] Introduction to nanoscience and nanotechnology
The maturation of nanotechnology has revealed it to be a unique and distinct discipline
rather than a specialization within a larger field. Its textbook cannot afford to be a chemistry …
rather than a specialization within a larger field. Its textbook cannot afford to be a chemistry …
An introduction to thin film processing using high-power impulse magnetron sputtering
High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized
physical vapor deposition technique and is already making its way to industrial applications …
physical vapor deposition technique and is already making its way to industrial applications …
Biaxial alignment in sputter deposited thin films
S Mahieu, P Ghekiere, D Depla, R De Gryse - Thin Solid Films, 2006 - Elsevier
Biaxially aligned thin films have not only a preferential crystallographic out-of-plane
orientation, but also have an alignment along a certain reference direction parallel to the …
orientation, but also have an alignment along a certain reference direction parallel to the …