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Recent progress in electrochemical pH-sensing materials and configurations for biomedical applications
pH-sensing materials and configurations are rapidly evolving toward exciting new
applications, especially those in biomedical applications. In this review, we highlight rapid …
applications, especially those in biomedical applications. In this review, we highlight rapid …
Electronic surface and dielectric interface states on GaN and AlGaN
GaN and AlGaN have shown great potential in next-generation high-power electronic
devices; however, they are plagued by a high density of interface states that affect device …
devices; however, they are plagued by a high density of interface states that affect device …
1-kV vertical Ga2O3 field-plated Schottky barrier diodes
K Konishi, K Goto, H Murakami, Y Kumagai… - Applied Physics …, 2017 - pubs.aip.org
Ga 2 O 3 field-plated Schottky barrier diodes (FP-SBDs) were fabricated on a Si-doped n−-
Ga 2 O 3 drift layer grown by halide vapor phase epitaxy on a Sn-doped n+-Ga 2 O 3 (001) …
Ga 2 O 3 drift layer grown by halide vapor phase epitaxy on a Sn-doped n+-Ga 2 O 3 (001) …
XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
X-ray photoelectron spectroscopy has been used to investigate the properties of AlN films
deposited using a low temperature plasma-enhanced atomic layer deposition process …
deposited using a low temperature plasma-enhanced atomic layer deposition process …
Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors
T Hashizume, S Ootomo, T Inagaki… - Journal of Vacuum …, 2003 - pubs.aip.org
We have systematically investigated effects of plasma processing, formation of Si-based
dielectrics, and formation of a thin Al 2 O 3 film on the chemical and electronic properties of …
dielectrics, and formation of a thin Al 2 O 3 film on the chemical and electronic properties of …
Hybrid tunnel junction contacts to III–nitride light-emitting diodes
In this work, we demonstrate highly doped GaN p–n tunnel junction (TJ) contacts on III–
nitride heterostructures where the active region of the device and the top p-GaN layers were …
nitride heterostructures where the active region of the device and the top p-GaN layers were …
Wafer-scale transfer route for top–down III-nitride nanowire LED arrays based on the femtosecond laser lift-off technique
The integration of gallium nitride (GaN) nanowire light-emitting diodes (nanoLEDs) on
flexible substrates offers opportunities for applications beyond rigid solid-state lighting (eg …
flexible substrates offers opportunities for applications beyond rigid solid-state lighting (eg …
Demonstration of 1200 V/1.4 mΩ cm2 vertical GaN planar MOSFET fabricated by an all ion implantation process
We present a vertical GaN planar metal-oxide-semiconductor field-effect transistor
(MOSFET) fabricated by an all ion implantation process. The fabricated MOSFET shows an …
(MOSFET) fabricated by an all ion implantation process. The fabricated MOSFET shows an …
[HTML][HTML] Effect of surface treatments on electrical properties of β-Ga2O3
The effect of various combinations of gaseous (ultraviolet/O 3), liquid (HCl, buffered oxide
etch, and H 2 O 2), or plasma (CF 4 and O 2) treatments of the surface of β-Ga 2 O 3 was …
etch, and H 2 O 2), or plasma (CF 4 and O 2) treatments of the surface of β-Ga 2 O 3 was …
Ultrashort pulse laser lift-off processing of InGaN/GaN light-emitting diode chips
Gallium nitride (GaN) film delamination is an important process during the fabrication of GaN
light-emitting diodes (LEDs) and laser diodes. Here, we utilize 520 nm femtosecond laser …
light-emitting diodes (LEDs) and laser diodes. Here, we utilize 520 nm femtosecond laser …