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Mode-division multiplexed transmission with inline few-mode fiber amplifier
We demonstrate mode-division multiplexed WDM transmission over 50-km of few-mode
fiber using the fiber's LP_01 and two degenerate LP_11 modes. A few-mode EDFA is used …
fiber using the fiber's LP_01 and two degenerate LP_11 modes. A few-mode EDFA is used …
U-Net convolutional neural network-based modification method for precise fabrication of three-dimensional microstructures using laser direct writing lithography
X Sun, S Yin, H Jiang, W Zhang, M Gao, J Du, C Du - Optics Express, 2021 - opg.optica.org
In this paper, a modification method based on a U-Net convolutional neural network is
proposed for the precise fabrication of three-dimensional microstructures using laser direct …
proposed for the precise fabrication of three-dimensional microstructures using laser direct …
High-resolution laser lithography system based on two-dimensional acousto-optic deflection
M Koechlin, G Poberaj, P Günter - Review of scientific instruments, 2009 - pubs.aip.org
We present an advanced high-resolution, compact laser lithography system for fast
prototy** of complex integrated optics devices comprising microring resonators and …
prototy** of complex integrated optics devices comprising microring resonators and …
Method for correcting the joint error of a laser writer
Y **e, Z Lu, F Li - Optics Express, 2003 - opg.optica.org
We present what we believe to be a new method for correcting the joint error of a laser writer
without reduction of throughput. By digitization, we optimize the intensity data of the incident …
without reduction of throughput. By digitization, we optimize the intensity data of the incident …
The generation of mould patterns for multimode optical waveguide components by direct laser writing of SU-8 at 364 nm
E Rabe, S Kopetz, A Neyer - Journal of Micromechanics and …, 2007 - iopscience.iop.org
A commercial direct laser writing system operating at 364 nm wavelength is used to expose
90 µm thick layers of SU-8 on silicon. The resist structures are the basis for the fabrication of …
90 µm thick layers of SU-8 on silicon. The resist structures are the basis for the fabrication of …
Calibration and pre-compensation of direct laser writing system
F Zhu, C Zhou, J Ma - Holography, Diffractive Optics, and …, 2012 - spiedigitallibrary.org
The Direct Laser Writing (DLW) technique has become a well-established, flexible and multi-
functional method of micro-and nano-technology. A DLW system, mainly containing blue …
functional method of micro-and nano-technology. A DLW system, mainly containing blue …
[PDF][PDF] Fabrication of polymer-based optofluidic microsystems for optical fluid analysis on printed circuit boards
E Sergeeva - 2018 - core.ac.uk
Next generation printed circuit boards, which are equipped with components and structures
for processing and transmitting both electrical and optical signals, are known as (hybrid) …
for processing and transmitting both electrical and optical signals, are known as (hybrid) …
[PDF][PDF] Precision laser direct writing of polymer optical waveguides and optofluidic systems
H Hartwig, E Sergeeva, N Thomas… - DGaO …, 2016 - dgao-proceedings.de
Polymer optical waveguides find their applications in optical interconnect solutions for data
communication or in integrated measurement devices for physical properties of liquids or …
communication or in integrated measurement devices for physical properties of liquids or …
Kinetic control of surface patterning by laser-induced photochemical deposition in liquid solutions. II. Experimental investigations
E Hugonnot, A Popescu, S Hanifi-Kadi… - Physical Review E …, 2004 - APS
We experimentally analyze the real-time formation of periodic surface patterning resulting
from laser-driven photochemical deposition in liquid solutions. Using photochemical …
from laser-driven photochemical deposition in liquid solutions. Using photochemical …
[PDF][PDF] 用于非球面检验的激光直写高精度计算全息图制作
赵龙波, 张志宇, 朱德燕, 延超, 郑立功… - Laser & Optoelectronics …, 2014 - researching.cn
摘要为实现高精度非球面的面形误差检测, 对激光直写计算全息图(CGH) 的关键技术进行研究.
以获得最小线宽偏差为目的, 通过基础工艺实验, 探究离焦量对光刻胶上线宽的影响; …
以获得最小线宽偏差为目的, 通过基础工艺实验, 探究离焦量对光刻胶上线宽的影响; …