To achieve high-precision nanometrology, a self-traceable grating reference material has
been reported and prepared using atom lithography and soft x-ray interference techniques …

This paper presents two optical methods for measuring nano step height standards and
discusses the deviations in the measurements in detail. A white light interference (WLI) …

Traceability is a fundamental issue for ensuring accuracy of nanometrology. A shortened
traceability chain is advantageous for reducing calibration steps, thus reducing errors and …

Pitch uncertainty and line edge roughness are among the critical quality attributes of a pitch
standard and normally the analyses of these two parameters are separate. The analysis of …

Surface plasmon polaritons, due to their tight spatial confinement and high local intensity,
hold great promises in nanofabrication which is beyond the diffraction limit of conventional …

Chromium atom photolithography gratings are a promising technology for the development
of nanoscale length standard substances due to their high accuracy, uniformity, and …

A white light interference system was developed with a speed-variable scanning technology
to improve signal utilization precision and short measuring time for a large step structure …

Background: As progress on the nanofabrication has made semiconductor developed
rapidly, there is an increasing need in precise pitch standards to calibrate the structure of …

One dimensional (1D) Cr nanograting fabricated by laser-focused atomic deposition (LFAD)
is suitable for reference materials in nanometrology, owing to its self-traceable to SI meter …

Atom lithography is a novel technique for nanofabrication which can be used to grow
periodic arrays of highly uniform nanometer-scale structures. The pitch standard of Cr nano …