Status of the growth and fabrication of AlGaN-based UV laser diodes for near and mid-UV wavelength

R Kirste, B Sarkar, P Reddy, Q Guo, R Collazo… - Journal of Materials …, 2021 - Springer
In this article, the development of mid-UV laser diodes based on the AlGaN materials system
is reviewed. The targeted wavelength for these lasers covers the range from 200 to 350 nm …

N-and P-type Do** in Al-rich AlGaN and AlN

B Sarkar, S Washiyama, MH Breckenridge… - ECS …, 2018 - iopscience.iop.org
Attaining a high conductivity in both p-type and n-type Al-rich AlGaN epitaxial films is
necessary for highly efficient deep-UV emitters. While reliable n-type conductivity has been …

[HTML][HTML] Defect-free Ni/GaN Schottky barrier behavior with high temperature stability

P Reddy, B Sarkar, F Kaess, M Gerhold, E Kohn… - Applied Physics …, 2017 - pubs.aip.org
In this work, we report on defect-free homogeneous behavior of Ni Schottky contacts
patterned on surface treated n-GaN by photolithography with unity ideality factor, high …

Performance and reliability of state-of-the-art commercial UVC light emitting diodes

J Loveless, R Kirste, B Moody, P Reddy… - Solid-State …, 2023 - Elsevier
Commercially-available, sapphire-and AlN-based ultraviolet-C light emitting diodes (UVC
LEDs) emitting in the range of 265–275 nm were evaluated and compared. Both AlN-and …

[HTML][HTML] High temperature and low pressure chemical vapor deposition of silicon nitride on AlGaN: Band offsets and passivation studies

P Reddy, S Washiyama, F Kaess… - Journal of Applied …, 2016 - pubs.aip.org
In this work, we employed X-ray photoelectron spectroscopy to determine the band offsets
and interface Fermi level at the heterojunction formed by stoichiometric silicon nitride …

Nonlinear analysis of vanadium-and titanium-based contacts to Al-rich n-AlGaN

BB Haidet, B Sarkar, P Reddy, I Bryan… - Japanese Journal of …, 2017 - iopscience.iop.org
In this work, we report on voltage dependent contact characteristics of Al-rich n-AlGaN due
to the presence of a Schottky barrier at the metal–AlGaN interface. Current–voltage …

A review of state of the art fabrication approaches for efficiency improvement in ultra-violet region light emitting diodes

I Mazumder, K Sapra, A Chauhan, M Mathew… - Materials Science in …, 2025 - Elsevier
This article addresses the significant methodology adopted for fabrication of Ultra Violet light
emitting Diodes (UV LED) in two different configurations termed as top-emitting and bottom …

Role of polarity in SiN on Al/GaN and the pathway to stable contacts

P Reddy, D Khachariya, D Szymanski… - Semiconductor …, 2020 - iopscience.iop.org
Despite being the most widely used dielectric for passivation of GaN-based lateral devices,
amorphous silicon-nitride still faces many stability challenges, which arise from its complex …

Progress and challenges of AlGaN Schottky diodes grown on AlN substrates

R Dalmau, HS Craft, R Schlesser, S Mita… - ECS …, 2017 - iopscience.iop.org
Quasi-vertical, high Al composition AlGaN Schottky diodes with breakdown voltages up to
500 V were grown on high quality AlN single crystal substrates. Diodes exhibited a~ 10 6 …

Demonstration of aluminum nitride metal oxide semiconductor field effect transistor on sapphire substrate

D Chettri, G Mainali, H Cao, JH Salcedo… - Journal of Physics D …, 2024 - iopscience.iop.org
Aluminum nitride (AlN) is a promising ultrawide bandgap material with significant
advantages for power electronics and optoelectronic applications due to its high breakdown …