Recent advances on kinetic analysis of solder joint reactions in 3D IC packaging technology

KN Tu, Y Liu - Materials Science and Engineering: R: Reports, 2019 - Elsevier
We review five solder joint reactions in 3D IC packaging technology which are of wide
interest:(1) Scallop-type growth of Cu 6 Sn 5 in solid-liquid interdiffusion reaction,(2) Whisker …

Metal silicides in CMOS technology: Past, present, and future trends

SL Zhang, M Östling - Critical Reviews in Solid State and Materials …, 2003 - Taylor & Francis
Metal silicides have played an indispensable role in the raped development of
microelectronics since PtSi was first used to improve the rectifying characteristics of diodes …

Thin film compound phase formation sequence: An effective heat of formation model

R Pretorius, TK Marais, CC Theron - Materials Science Reports, 1993 - Elsevier
An effective heat of formation (EHF) model for predicting compound phase formation
sequence is described. The EHF model defines an effective heat of formation ΔH′, which is …

Silicides for integrated circuits: TiSi2 CoSi2

K Maex - Materials Science and Engineering: R: Reports, 1993 - Elsevier
Silicides have been a topic of intensive research for more than a decade. The driving force
for these investigations has certainly been the interesting materials aspects of the silicides …

Reaction diffusion and solid state chemical kinetics

VI Dybkov - 2010 - torrossa.com
The monograph deals with a physico-chemical approach to the problem of solid-state
growth of chemical compound layers and reaction diffusion in binary heterogeneous …

Hollow nanostructures based on the Kirkendall effect: Design and stability considerations

KN Tu, U Gösele - Applied Physics Letters, 2005 - pubs.aip.org
In nanoscale interdiffusion and reaction, a Kirkendall void in the core of a nanocrystal has
been proposed to explain the formation of hollow nanosize particles in recent literature. We …

Implanted noble gas atoms as diffusion markers in silicide formation

WK Chu, SS Lau, JW Mayer, H Müller, KN Tu - Thin Solid Films, 1975 - Elsevier
Implanted noble gas atoms of Ar and Xe have been used as diffusion markers in growth
studies of silicides formed by reacting metal films with silicon substrates. MeV 4 He ion …

Formation and characterization of transition-metal silicides

MA Nicolet, SS Lau - VLSI Electronics Microstructure Science, 1983 - Elsevier
Publisher Summary This chapter focuses on formation and characterization of transition-
metal silicides. Many deposition techniques can be applied to form thin silicide layers on …

Transition metal silicides in silicon technology

AH Reader, AH Van Ommen, PJW Weijs… - Reports on Progress …, 1993 - iopscience.iop.org
Studies of the properties and characteristics of transition metal silicides have been
stimulated by their (potential) use in integrated circuit technology. This review describes …

Selective growth of metal‐rich silicide of near‐noble metals

KN Tu - Applied Physics Letters, 1975 - pubs.aip.org
Near-noble metals react with Si to form a metal-rich silicide at 100 to 200· C. Growth of the
silicide is selected by the criterion that diffusion of near-noble metal atoms to the silicide …