Strategies for inorganic incorporation using neat block copolymer thin films for etch mask function and nanotechnological application
Block copolymers (BCPs) and their directed self‐assembly (DSA) has emerged as a
realizable complementary tool to aid optical patterning of device elements for future …
realizable complementary tool to aid optical patterning of device elements for future …
Rapid ordering of block copolymer thin films
Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be
finely tuned via block architecture and processing conditions. However, the ultimate usage …
finely tuned via block architecture and processing conditions. However, the ultimate usage …
50th Anniversary Perspective: Block PolymersPure Potential
Block polymers have undergone extraordinary evolution since their inception more than 60
years ago, maturing from simple surfactants to an expansive class of macromolecules …
years ago, maturing from simple surfactants to an expansive class of macromolecules …
MoS2 Field-Effect Transistor with Sub-10 nm Channel Length
Atomically thin molybdenum disulfide (MoS2) is an ideal semiconductor material for field-
effect transistors (FETs) with sub-10 nm channel lengths. The high effective mass and large …
effect transistors (FETs) with sub-10 nm channel lengths. The high effective mass and large …
Nanoscale chemical imaging by photoinduced force microscopy
D Nowak, W Morrison, HK Wickramasinghe… - Science …, 2016 - science.org
Correlating spatial chemical information with the morphology of closely packed
nanostructures remains a challenge for the scientific community. For example …
nanostructures remains a challenge for the scientific community. For example …
Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat
Directed self-assembly (DSA) of the domain structure in block copolymer (BCP) thin films is
a promising approach for sub-10-nm surface patterning. DSA requires the control of …
a promising approach for sub-10-nm surface patterning. DSA requires the control of …
Single-step dual-layer photolithography for tunable and scalable nanopatterning
Conventional photolithography, due to its scalability, robustness, and straightforward
processes, has been widely applied to micro-and nanostructure manufacturing in …
processes, has been widely applied to micro-and nanostructure manufacturing in …
Directed self-assembly of block copolymers for 7 nanometre FinFET technology and beyond
The drive to deliver increasingly powerful and feature-rich integrated circuits has made
technology node scaling—the process of reducing transistor dimensions and increasing …
technology node scaling—the process of reducing transistor dimensions and increasing …
The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography
We explore the lithographic limits of lamellae-forming PS-b-PMMA block copolymers by
performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials …
performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials …
Directed self-assembly and pattern transfer of five nanometer block copolymer lamellae
The directed self-assembly (DSA) and pattern transfer of poly (5-vinyl-1, 3-benzodioxole-
block-pentamethyldisilylstyrene)(PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b …
block-pentamethyldisilylstyrene)(PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b …