Toward realization of high-throughput hyperspectral imaging technique for semiconductor device metrology
C Yoon, G Park, D Han, S Im, S Jo… - Journal of Micro …, 2022 - spiedigitallibrary.org
Background: High-throughput three-dimensional metrology techniques for monitoring in-
wafer uniformity (IWU) and in-cell uniformity (ICU) are critical for enhancing the yield of …
wafer uniformity (IWU) and in-cell uniformity (ICU) are critical for enhancing the yield of …
Multi spectral holographic ellipsometry for a complex 3D nanostructure
We present an innovative ellipsometry technique called self-interferometric pupil
ellipsometry (SIPE), which integrates self-interference and pupil microscopy techniques to …
ellipsometry (SIPE), which integrates self-interference and pupil microscopy techniques to …
A new approach in optical metrology with multi-angle information through self-interferometric ellipsometry
W Kim, J Jung, J Kim, I Shin, N Kim… - … Optical Metrology IV, 2021 - spiedigitallibrary.org
An innovative self-interferometric pupil ellipsometry (SIPE) has been demonstrated to
overcome the spectral sensitivity and throughput limitations for optical critical dimensions …
overcome the spectral sensitivity and throughput limitations for optical critical dimensions …
Sensitivity and repeatability performance on overlay and CD measurement by incorporating hologram based ellipsometry
Y Hidaka, J Kim, J Jung, M Numata… - Metrology …, 2022 - spiedigitallibrary.org
A recently introduced novel concept ellipsometry, characterized by its unique derivation
process of directly extracting the polarization information from the hologram image on pupil …
process of directly extracting the polarization information from the hologram image on pupil …
Improving the accuracy and precision of OCD measurement by systematic error correction in self-interference pupil ellipsometry
To achieve high accuracy and precision in optical metrology for advanced semiconductors, it
is crucial to identify and compensate for errors from optical components and environmental …
is crucial to identify and compensate for errors from optical components and environmental …
Mueller matrix metrology with multi-angle information using multiple self-interference
An innovative metrology technique has been devised to address current limitations of optical
critical dimension (OCD) in advanced semiconductor metrology. This technique is based on …
critical dimension (OCD) in advanced semiconductor metrology. This technique is based on …