High-energy ultrashort pulse optical lasers operating at high repetition rate are required to
drive intense compact coherent soft X-ray sources, including soft X-ray lasers, for …

Plasmonic color filters in mass production have been restricted from current fabrication
technology, which impede their applications. Soft-X-ray interference lithography (XIL) has …

In this chapter, the key concepts underlying nanolithography will be described and the main
nanolithography techniques will be introduced and compared in terms of the achievable …

With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography,
constant improvements in light source design and cost-efficiency are required. Currently …

Obtaining high-quality images from physical systems, objects, and processes is fundamental
for a myriad of areas of science and technology. However, in many situations, the measured …

This work describes the generation and matter interactions of laser radiation with
wavelengths between approximately 10 and 100 nanometres. The properties and dynamics …

Plasmonic metamaterials provide a great deal of optical tunability and interesting
phenomena in terms of light-matter interaction. Metal-Insulator-Metal (MIM) nanocavities are …

We present the latest results in the development of a Talbot lithography technique utilizing
tabletop SXR lasers. The main characteristics of the method are reviewed and a hybrid …

Soft X-ray lasers (SXRLs) produce the highest energy pulses of coherent ultrashort
wavelength radiation. Their large number of photons per pulse allow us to perform single …

We will review recent progress in the development of high repetition, high average power
rate soft x-ray lasers at 10-20 nm wavelength at Colorado State University, and the compact …