Theory and practice of SiC growth on Si and its applications to wide-gap semiconductor films

SA Kukushkin, AV Osipov - Journal of Physics D: Applied Physics, 2014 - iopscience.iop.org
The recent advances in epitaxial SiC films' growth on Si are overviewed. The basic classical
methods currently used for SiC films' growth are discussed and their advantages and …

Synthesis of epitaxial silicon carbide films through the substitution of atoms in the silicon crystal lattice: A review

SA Kukushkin, AV Osipov, NA Feoktistov - Physics of the Solid State, 2014 - Springer
A review of recent advances in the field of epitaxial growth of SiC films on Si by means of a
new method of epitaxial substitution of film atoms for substrate atoms has been presented …

InP-based transistor fabrication

P Ye, Z Cheng, Y Xuan, Y Wu, B Adekore… - US Patent …, 2012 - Google Patents
5,061,644 5,079,616 5,091,333 5,091,767 5,093,699 5,098,850 5,105,247 5,108,947
5,156,995 5,159,413 5,164.359 5,166,767 5,223,043 5,236,546 5,238,869 5,256,594 …

Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication

AJ Lochtefeld, MT Currie, Z Cheng, J Fiorenza… - US Patent …, 2012 - Google Patents
(65) Prior Publication Data(Continued) US 2011 FOO49568 A1 Mar. 3, 2011 OTHER
PUBLICATIONS Related US Application Data 68 Applied Physics Letters 7, pp. 774-779 …

[PDF][PDF] Substrates for epitaxy of gallium nitride: new materials and techniques

SA Kukushkin, AV Osipov, VN Bessolov… - Rev. Adv. Mater. Sci, 2008 - ipme.ru
Different techniques for epitaxial growth of gallium nitride and main properties of GaN layers
as well as devices made on the base of GaN-structures are described in the review. A new …

Tri-gate field-effect transistors formed by aspect ratio trap**

AJ Lochtefeld - US Patent 7,799,592, 2010 - Google Patents
Semiconductor structures include a trench formed proximate (56) References Cited a
Substrate including a first semiconductor material. A crys talline material including a second …

Defect reduction using aspect ratio trap**

J Bai, JS Park, AJ Lochtefeld - US Patent 8,173,551, 2012 - Google Patents
2006/0267047 A1 11/2006 Murayama 2006/0292719 A1 12/2006 Lochtefeld et al.
2007/0029643 A1 2/2007 Johnson et al. 2007/0054465 A1 3/2007 Currie et al …

Lattice-mismatched semiconductor structures and related methods for device fabrication

AJ Lochtefeld - US Patent 7,777,250, 2010 - Google Patents
5,034,337 A 7, 1991 Mosher et al. 5,061,644 A 10, 1991 Yue et al. 5,091,333 A 2f1992 Fan
et al. 5,091,767 A 2f1992 Bean et al. 5,093,699 A 3, 1992 Weichold et al. 5,105,247 A …

Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication

J Li, AJ Lochtefeld - US Patent 9,153,645, 2015 - Google Patents
US9153645B2 - Lattice-mismatched semiconductor structures with reduced dislocation
defect densities and related methods for device fabrication - Google Patents US9153645B2 …

Photovoltaics on silicon

J Li, AJ Lochtefeld, C Sheen, Z Cheng - US Patent 9,508,890, 2016 - Google Patents
4,551.394 A 11/1985 Betsch et al. 4,651,179 A 3, 1987 Reichert 4,727,047 A 2f1988 Bozler
et al. 4,774,205 A 9, 1988 Choi et al. 4,789,643 A 12/1988 Kajikawa et al. 4,826,784. A …