Theory and practice of SiC growth on Si and its applications to wide-gap semiconductor films
SA Kukushkin, AV Osipov - Journal of Physics D: Applied Physics, 2014 - iopscience.iop.org
The recent advances in epitaxial SiC films' growth on Si are overviewed. The basic classical
methods currently used for SiC films' growth are discussed and their advantages and …
methods currently used for SiC films' growth are discussed and their advantages and …
Synthesis of epitaxial silicon carbide films through the substitution of atoms in the silicon crystal lattice: A review
SA Kukushkin, AV Osipov, NA Feoktistov - Physics of the Solid State, 2014 - Springer
A review of recent advances in the field of epitaxial growth of SiC films on Si by means of a
new method of epitaxial substitution of film atoms for substrate atoms has been presented …
new method of epitaxial substitution of film atoms for substrate atoms has been presented …
InP-based transistor fabrication
5,061,644 5,079,616 5,091,333 5,091,767 5,093,699 5,098,850 5,105,247 5,108,947
5,156,995 5,159,413 5,164.359 5,166,767 5,223,043 5,236,546 5,238,869 5,256,594 …
5,156,995 5,159,413 5,164.359 5,166,767 5,223,043 5,236,546 5,238,869 5,256,594 …
Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication
(65) Prior Publication Data(Continued) US 2011 FOO49568 A1 Mar. 3, 2011 OTHER
PUBLICATIONS Related US Application Data 68 Applied Physics Letters 7, pp. 774-779 …
PUBLICATIONS Related US Application Data 68 Applied Physics Letters 7, pp. 774-779 …
[PDF][PDF] Substrates for epitaxy of gallium nitride: new materials and techniques
SA Kukushkin, AV Osipov, VN Bessolov… - Rev. Adv. Mater. Sci, 2008 - ipme.ru
Different techniques for epitaxial growth of gallium nitride and main properties of GaN layers
as well as devices made on the base of GaN-structures are described in the review. A new …
as well as devices made on the base of GaN-structures are described in the review. A new …
Tri-gate field-effect transistors formed by aspect ratio trap**
AJ Lochtefeld - US Patent 7,799,592, 2010 - Google Patents
Semiconductor structures include a trench formed proximate (56) References Cited a
Substrate including a first semiconductor material. A crys talline material including a second …
Substrate including a first semiconductor material. A crys talline material including a second …
Defect reduction using aspect ratio trap**
J Bai, JS Park, AJ Lochtefeld - US Patent 8,173,551, 2012 - Google Patents
2006/0267047 A1 11/2006 Murayama 2006/0292719 A1 12/2006 Lochtefeld et al.
2007/0029643 A1 2/2007 Johnson et al. 2007/0054465 A1 3/2007 Currie et al …
2007/0029643 A1 2/2007 Johnson et al. 2007/0054465 A1 3/2007 Currie et al …
Lattice-mismatched semiconductor structures and related methods for device fabrication
AJ Lochtefeld - US Patent 7,777,250, 2010 - Google Patents
5,034,337 A 7, 1991 Mosher et al. 5,061,644 A 10, 1991 Yue et al. 5,091,333 A 2f1992 Fan
et al. 5,091,767 A 2f1992 Bean et al. 5,093,699 A 3, 1992 Weichold et al. 5,105,247 A …
et al. 5,091,767 A 2f1992 Bean et al. 5,093,699 A 3, 1992 Weichold et al. 5,105,247 A …
Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication
J Li, AJ Lochtefeld - US Patent 9,153,645, 2015 - Google Patents
US9153645B2 - Lattice-mismatched semiconductor structures with reduced dislocation
defect densities and related methods for device fabrication - Google Patents US9153645B2 …
defect densities and related methods for device fabrication - Google Patents US9153645B2 …
Photovoltaics on silicon
J Li, AJ Lochtefeld, C Sheen, Z Cheng - US Patent 9,508,890, 2016 - Google Patents
4,551.394 A 11/1985 Betsch et al. 4,651,179 A 3, 1987 Reichert 4,727,047 A 2f1988 Bozler
et al. 4,774,205 A 9, 1988 Choi et al. 4,789,643 A 12/1988 Kajikawa et al. 4,826,784. A …
et al. 4,774,205 A 9, 1988 Choi et al. 4,789,643 A 12/1988 Kajikawa et al. 4,826,784. A …