Silicon–germanium nanowires: chemistry and physics in play, from basic principles to advanced applications

M Amato, M Palummo, R Rurali, S Ossicini - Chemical reviews, 2014 - ACS Publications
The trend predicted by Moore's law sets forth strict requirements on the electronic properties
of materials that cannot always be satisfied by conventional semiconductors. Thus, the last …

Oxidation-boosted charge trap** in ultra-sensitive van der Waals materials for artificial synaptic features

FS Yang, M Li, MP Lee, IY Ho, JY Chen, H Ling… - Nature …, 2020 - nature.com
Exploitation of the oxidation behaviour in an environmentally sensitive semiconductor is
significant to modulate its electronic properties and develop unique applications. Here, we …

High mobilities in layered InSe transistors with indium‐encapsulation‐induced surface charge do**

M Li, CY Lin, SH Yang, YM Chang… - Advanced …, 2018 - Wiley Online Library
Tunability and stability in the electrical properties of 2D semiconductors pave the way for
their practical applications in logic devices. A robust layered indium selenide (InSe) field …

Noise spectroscopy of nanowire structures: fundamental limits and application aspects

S Vitusevich, I Zadorozhnyi - Semiconductor Science and …, 2017 - iopscience.iop.org
Nanowires (NWs) have recently emerged as a new class of materials demonstrating unique
properties which may completely differ from their bulk counterparts. The main aim of this …

Low-Frequency Noise Related to the Scattering Effect in p-Type Copper (I) Oxide Thin-Film Transistors

J Yoo, S Park, H Lee, S Lim, H Song… - … Applied Materials & …, 2025 - ACS Publications
In this study, we investigate the origins of low-frequency noise (LFN) and 1/f noise in Cu2O
thin-film transistors (TFTs). The static direct current (DC) I–V characterization demonstrates …

Low-frequency noise in junctionless multigate transistors

D Jang, JW Lee, CW Lee, JP Colinge, L Montès… - Applied Physics …, 2011 - pubs.aip.org
Low-frequency noise in n-type junctionless multigate transistors was investigated. It can be
well understood with the carrier number fluctuations whereas the conduction is mainly …

Low-frequency noise behavior of tunneling field effect transistors

J Wan, C Le Royer, A Zaslavsky… - Applied Physics …, 2010 - pubs.aip.org
We report on the low-frequency noise (LFN) properties of tunneling field effect transistors
(TFETs) fabricated on silicon-on-insulator substrate. Unlike conventional large FETs, where …

Intermittent O2 Plasma Treatment as a Novel Strategy to Optimize the Electrical Properties of Nanofibers-Based Transistors

B He, G He, Q Hu, W Wang, Y Li… - IEEE Transactions on …, 2023 - ieeexplore.ieee.org
In this work, intermittent O 2 plasma treatment (IOPT) is demonstrated to optimize the
electrical performance of In 2 O 3-based thin-film transistors (TFTs) based on …

[HTML][HTML] Low-frequency noise in quasi-ballistic monolithic Al–Ge–Al nanowire field effect transistors

R Behrle, M Sistani, A Lugstein… - Applied Physics …, 2023 - pubs.aip.org
In this work, Al 2 O 3-passivated, monolithic, and crystalline Al–Ge–Al heterostructure
nanowire field effect transistors (FETs) with Ge channel lengths ranging from 18 to 826 nm …

Controlled growth of SiGe nanowires by addition of HCl in the gas phase

A Potié, T Baron, L Latu-Romain, G Rosaz… - Journal of Applied …, 2011 - pubs.aip.org
Growth of Si, Ge, and, thus, SiGe nanowires (NWs) by catalyzed chemical vapor deposition
proceeds at different process conditions, preventing easy realization of axial multijunctions …