Synthesis and applications of III–V nanowires

E Barrigón, M Heurlin, Z Bi, B Monemar… - Chemical …, 2019 - ACS Publications
Low-dimensional semiconductor materials structures, where nanowires are needle-like one-
dimensional examples, have developed into one of the most intensely studied fields of …

State of the art and future perspectives in advanced CMOS technology

HH Radamson, H Zhu, Z Wu, X He, H Lin, J Liu… - Nanomaterials, 2020 - mdpi.com
The international technology roadmap of semiconductors (ITRS) is approaching the
historical end point and we observe that the semiconductor industry is driving …

Challenges and limitations of CMOS scaling for FinFET and beyond architectures

A Razavieh, P Zeitzoff, EJ Nowak - IEEE Transactions on …, 2019 - ieeexplore.ieee.org
Scaling trends of FinFET architecture, with focus on Front-End-of-Line (FEOL), and Middle-of-
Line (MOL) device parameters, is systematically investigated. It is concluded that the …

Device exploration of nanosheet transistors for sub-7-nm technology node

D Jang, D Yakimets, G Eneman… - … on Electron Devices, 2017 - ieeexplore.ieee.org
In this paper, lateral gate-all-around nano-sheet transistors (NSH-FETs) are explored from
intrinsic performance to dc and ring oscillator (RO) benchmark compared with FinFETs and …

Demonstration of germanium vertical gate-all-around field-effect transistors featured by self-aligned high-κ metal gates with record high performance

L **e, H Zhu, Y Zhang, X Ai, J Li, G Wang, J Liu, A Du… - ACS …, 2023 - ACS Publications
A special Ge nanowire/nanosheet (NW/NS) p-type vertical sandwich gate-all-around (GAA)
field-effect transistor (FET)(Ge NW/NS pVSAFET) with self-aligned high-κ metal gates …

Steep-slope vertical-transport transistors built from sub-5 nm Thin van der Waals heterostructures

Q Yang, ZD Luo, H Duan, X Gan, D Zhang, Y Li… - Nature …, 2024 - nature.com
Abstract Two-dimensional (2D) semiconductor-based vertical-transport field-effect
transistors (VTFETs)–in which the current flows perpendicularly to the substrate surface …

High-density logic-in-memory devices using vertical indium arsenide nanowires on silicon

MS Ram, KM Persson, A Irish, A Jönsson, R Timm… - Nature …, 2021 - nature.com
In-memory computing can be used to overcome the von Neumann bottleneck—the need to
shuffle data between separate memory and computational units—and help improve …

Vertical tunnel FET: Design optimization with triple metal-gate layers

E Ko, H Lee, JD Park, C Shin - IEEE Transactions on Electron …, 2016 - ieeexplore.ieee.org
The effect of a triple metal-gate (TMG) on the performance and on the ambipolar current in a
TMG vertical tunnel field-effect transistor with triple metal-gate (TMG-TFET) is investigated …

Vertical sandwich gate-all-around field-effect transistors with self-aligned high-k metal gates and small effective-gate-length variation

X Yin, Y Zhang, H Zhu, GL Wang, JJ Li… - IEEE Electron …, 2019 - ieeexplore.ieee.org
A new type of vertical nanowire (NW)/nanosheet (NS) field-effect transistors (FETs), termed
vertical sandwich gate-all-around (GAA) FETs (VSAFETs), is presented in this work …

Characteristics of stacked gate-all-around Si nanosheet MOSFETs with metal sidewall source/drain and their impacts on CMOS circuit properties

WL Sung, Y Li - IEEE Transactions on Electron Devices, 2021 - ieeexplore.ieee.org
In this brief, we computationally examine electrical characteristics of stacked gate-all-around
Si nanosheet MOSFETs (GAA NS-FETs) with and without metal sidewall (MSW) …