Bottom-up nanofabrication by area-selective atomic layer deposition (ALD) is currently
gaining momentum in semiconductor processing, because of the increasing need for …

Atomic Layer Deposition: An Overview | Chemical Reviews Recently Viewedclose modal ACS
ACS Publications C&EN CAS Find my institution Log In ACS Publications. Most Trusted. Most …

The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …

This review provides an overview of area-selective thin film deposition (ASD) with a primary
focus on vapor-phase thin film formation via chemical vapor deposition (CVD) and atomic …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with
atomic level control of the thickness and an excellent conformality on 3-dimensional …

Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly
developed from a niche technology to an established method. It proved to be a key …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

Atomic layer deposition (ALD) is a cyclic process which relies on sequential self-terminating
reactions between gas phase precursor molecules and a solid surface. The self-limiting …

The incorporation of nanostructured photocatalysts in polymers is a strategic way to obtain
novel water purification systems. This approach takes the advantages of:(1) the presence of …