Metal nitride nanostructures have been predicted to exhibit plasmonic responses in the UV
to IR region, which can enable their potential use as low-cost, chemically, and thermally …

Titanium nitride (TiN) has recently emerged as an attractive alternative material for
plasmonics. However, the typical high-temperature deposition of plasmonic TiN using either …

Refractory plasmonic materials that have optical properties close to those of noble-metals
and at the same time are environmentally friendly, commercially viable and CMOS …

Here, we propose a planar hot-electron photodetector based on broadband Tamm plasmon
resonance using a TiN layer, n-type doped Si layer, and seven pairs of DBRs. Simulation …

This study reports the optical, electrical and mechanical properties of TiN films prepared by
direct rapid thermal nitridation process from a photo-patternable TiO 2 sol-gel layer. The sol …

High aspect ratio titanium nitride (TiN) grating structures are fabricated by the combination of
deep reactive ion etching (DRIE) and atomic layer deposition (ALD) techniques. TiN is …

Electromagnetic radiation when coupled to collective oscillations of free electrons, dubbed
as plasmonics, makes it possible to manipulate light at dimensions well below the diffraction …

Robust and high-temperature stable (refractory) transition metal nitrides are an emerging
class of nanophotonic materials aimed at durable, bio-and CMOS-compatible plasmonic …

We present a comparative study of the optical properties of 50 nm-thick titanium nitride (TiN)
films deposited on a silicon substrate by pulsed-DC sputtering, thermal, and plasma …

We present the fabrication of tunable plasmonic hafnium nitride (HfN) nanoparticles. HfN is a
metallic refractory material with the potential of supporting plasmon resonances in the visible …