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On the possibility of synthesis of silicon carbide using an indirect-action plasma gun
RD Gerasimov, VV Shekhovtsov, YZ Vasil'eva… - Journal of Engineering …, 2024 - Springer
The paper presents the results of experimental and theoretical investigations into the
synthesis of silicon carbide using the energy of thermal plasma. The experimental …
synthesis of silicon carbide using the energy of thermal plasma. The experimental …
Conformal TiO2 Aerogel-Like Films by Plasma Deposition: from Omniphobic Antireflective Coatings to Perovskite Solar Cell Photoelectrodes
JM Obrero, L Contreras-Bernal… - … Applied Materials & …, 2024 - ACS Publications
The ability to control the porosity of thin oxide films is a key factor determining their
properties. Despite the abundance of dry processes for synthesizing oxide porous layers, a …
properties. Despite the abundance of dry processes for synthesizing oxide porous layers, a …
Porous Nanostructured Materials for Electroanalytical Applications
N Butwong - … of Nanobioelectrochemistry: Application in Devices and …, 2023 - Springer
Nanoporous materials having a porosity of 1–100 nm and excellent functional moieties are
unique with high surface area and selective adsorption. Nanomaterials are a subset of …
unique with high surface area and selective adsorption. Nanomaterials are a subset of …
[PDF][PDF] Materials Today Nano
D Hegemann, M Góra, F Kalemi, P Navascués - researchgate.net
Dust contamination is a frequent problem when processing materials at the nanoscale by
plasma technology. Various approaches have thus been applied to protect samples …
plasma technology. Various approaches have thus been applied to protect samples …