Considerations for ultimate CMOS scaling

KJ Kuhn - IEEE transactions on Electron Devices, 2012 - ieeexplore.ieee.org
This review paper explores considerations for ultimate CMOS transistor scaling. Transistor
architectures such as extremely thin silicon-on-insulator and FinFET (and related …

Colloquium: Structural, electronic, and transport properties of silicon nanowires

R Rurali - Reviews of Modern Physics, 2010 - APS
In this Colloquium the theory of silicon nanowires is reviewed. Nanowires with diameters
below 10 nm are the focus, where quantum effects become important and the properties …

Ge/Si nanowire heterostructures as high-performance field-effect transistors

J **ang, W Lu, Y Hu, Y Wu, H Yan, CM Lieber - nature, 2006 - nature.com
Semiconducting carbon nanotubes, and nanowires are potential alternatives to planar metal-
oxide-semiconductor field-effect transistors (MOSFETs) owing, for example, to their unique …

Atomic layer etching: An industry perspective

CT Carver, JJ Plombon, PE Romero… - ECS Journal of Solid …, 2015 - iopscience.iop.org
This paper provides an industry perspective on atomic layer etching (ALEt) process. Two
process sequences representing two different methods of ALEt are described, followed by …

Modeling of electron mobility in gated silicon nanowires at room temperature: Surface roughness scattering, dielectric screening, and band nonparabolicity

S **, MV Fischetti, T Tang - Journal of Applied Physics, 2007 - pubs.aip.org
We present a theoretical study of electron mobility in cylindrical gated silicon nanowires at
300 K based on the Kubo-Greenwood formula and the self-consistent solution of the …

Influence of dimensionality on thermoelectric device performance

R Kim, S Datta, MS Lundstrom - Journal of Applied Physics, 2009 - pubs.aip.org
The role of dimensionality on the electronic performance of thermoelectric devices is
clarified using the Landauer formalism, which shows that the thermoelectric coefficients are …

Tunable electronic transport characteristics of surface-architecture-controlled ZnO nanowire field effect transistors

WK Hong, JI Sohn, DK Hwang, SS Kwon, G Jo… - Nano Letters, 2008 - ACS Publications
Surface-architecture-controlled ZnO nanowires were grown using a vapor transport method
on various ZnO buffer film coated c-plane sapphire substrates with or without Au catalysts …

Three-dimensional transistors with two-dimensional semiconductors for future CMOS scaling

A Pal, T Chavan, J Jabbour, W Cao, K Banerjee - Nature Electronics, 2024 - nature.com
Atomically thin two-dimensional (2D) semiconductors—particularly transition metal
dichalcogenides—are potential channel materials for post-silicon complementary metal …

Si, SiGe nanowire devices by top–down technology and their applications

N Singh, KD Buddharaju, SK Manhas… - … on Electron Devices, 2008 - ieeexplore.ieee.org
Nanowire (NW) devices, particularly the gate-all-around (GAA) CMOS architecture, have
emerged as the front-runner for pushing CMOS scaling beyond the roadmap. These devices …

A massively-parallel electronic-structure calculations based on real-space density functional theory

JI Iwata, D Takahashi, A Oshiyama, T Boku… - Journal of …, 2010 - Elsevier
Based on the real-space finite-difference method, we have developed a first-principles
density functional program that efficiently performs large-scale calculations on massively …