Operando surface characterization of InP nanowire p–n junctions
SR McKibbin, J Colvin, A Troian, JV Knutsson… - Nano …, 2019 - ACS Publications
We present an in-depth analysis of the surface band alignment and local potential
distribution of InP nanowires containing ap–n junction using scanning probe and …
distribution of InP nanowires containing ap–n junction using scanning probe and …
Atomic Structures and Chemical States of Active and Inactive Dopant Sites in Si-Doped GaN
J Tang, Y Yamashita - ACS Applied Electronic Materials, 2021 - ACS Publications
The atomic structures and the electronic states of active and inactive dopant sites in
semiconductor are elucidated successfully by using X-ray absorption near-edge structure …
semiconductor are elucidated successfully by using X-ray absorption near-edge structure …
Photo-assisted Kelvin probe force microscopy investigation of three dimensional GaN structures with various crystal facets, do** types, and wavelengths of …
M Ali Deeb, J Ledig, J Wei, X Wang… - Journal of Applied …, 2017 - pubs.aip.org
Three dimensional GaN structures with different crystal facets and do** types have been
investigated employing the surface photo-voltage (SPV) method to monitor illumination …
investigated employing the surface photo-voltage (SPV) method to monitor illumination …
Si–Sn codoped n-GaN film sputtering grown on an amorphous glass substrate
WS Liu, YL Chang, TC Chen, SC Yu… - Semiconductor Science …, 2023 - iopscience.iop.org
DC-pulse magnetron sputtering was utilized to deposit a 300 nm-thick n-type GaN thin film
that was co-doped with Si–Sn onto an amorphous glass substrate with a ZnO buffer layer …
that was co-doped with Si–Sn onto an amorphous glass substrate with a ZnO buffer layer …
Atomic Structures and Chemical states of active and inactive dopants in GaN
Y Yamashita, J Tang, Y Hashimote… - ECS …, 2023 - iopscience.iop.org
We investigated atomic structures and chemical states of active and inactive dopant sites for
Mg-and Si-doped in GaN using photoelectron holography and X-ray absorption near edge …
Mg-and Si-doped in GaN using photoelectron holography and X-ray absorption near edge …
Surface and Interface Characterization in Organic Electronics
N Witkowski - World Scientific Reference of Hybrid Materials …, 2019 - World Scientific
Organic and hybrid devices are very complex systems involving layers having very specific
electronic properties (semiconducting, isolating, dielectric materials). The efficiency of the …
electronic properties (semiconducting, isolating, dielectric materials). The efficiency of the …
[PDF][PDF] Synchrotron X-ray based characterization of technologically relevant III-V surfaces and nanostructures
A Troian - 2019 - portal.research.lu.se
Innovative design and materials are needed to satisfy the demand for efficient and scalable
devices for electronic and opto-electronic applications, such as transistors, LEDs, and solar …
devices for electronic and opto-electronic applications, such as transistors, LEDs, and solar …
Si–Sn Codoped N-Gan Film Grown on an Amorphous Glass Substrate with Dc-Pulse Sputtering
WS Liu, YL Chang, TC Chen, SC Yu… - Available at SSRN … - papers.ssrn.com
DC-pulse magnetron sputtering was used to deposit a 300-nm-thick Si–Sn codoped n-type
GaN film on an amorphous glass substrate with a ZnO buffer layer. Postgrowth thermal …
GaN film on an amorphous glass substrate with a ZnO buffer layer. Postgrowth thermal …
Si ドープ GaN (0001) におけるドーパントの活性サイト・不活性サイトの化学状態解明
山下良之 - 表面と真空, 2022 - jstage.jst.go.jp
抄録 We have investigated the electronic states of active and inactive dopant sites in Si-
doped GaN using the X-ray absorption near-edge structure (XANES), Auger electron …
doped GaN using the X-ray absorption near-edge structure (XANES), Auger electron …