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Self-brushing for nanopatterning: achieving perpendicular domain orientation in block copolymer thin films
The self-assembly of thin films of block copolymers (BCPs) with perpendicular domain
orientation offers a promising approach for nanopatterning on a variety of substrates, which …
orientation offers a promising approach for nanopatterning on a variety of substrates, which …
Fabrication of model ultrafiltration membranes with uniform, high aspect ratio pores
W Chen, S Yim, NJ Zaluzec, GSW Craig… - Journal of Vacuum …, 2024 - pubs.aip.org
In this manuscript, we report the facile fabrication of large-area model membranes with
highly uniform and high aspect ratio pores with diameters< 20 nm. These membranes are …
highly uniform and high aspect ratio pores with diameters< 20 nm. These membranes are …
Self-Brushing Block Copolymers for Defect Self-Healing in Directed Self-Assembly
We report the use of a block copolymer (BCP) self-brushing mechanism for surface
modification of Si substrates to heal defects in patterns generated for directed self-assembly …
modification of Si substrates to heal defects in patterns generated for directed self-assembly …
Investigation of Block Copolymers for Nanolithography
R Kumar - 2024 - search.proquest.com
Block copolymer (BCP) nanolithography provides an economical way to pattern nanoscale
features for the semiconductor industry. Over time many strategies have been formulated to …
features for the semiconductor industry. Over time many strategies have been formulated to …