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Transparent p-type semiconductors: copper-based oxides and oxychalcogenides
N Zhang, J Sun, H Gong - Coatings, 2019 - mdpi.com
While p-type transparent conducting materials (TCMs) are crucial for many optoelectronic
applications, their performance is still not satisfactory. This has impeded the development of …
applications, their performance is still not satisfactory. This has impeded the development of …
Control over charge carrier mobility in the hole transport layer enables fast colloidal quantum dot infrared photodetectors
Solution-processed colloidal quantum dots (CQDs) are promising materials for
photodetectors operating in the short-wavelength infrared region (SWIR). Devices typically …
photodetectors operating in the short-wavelength infrared region (SWIR). Devices typically …
Vacancy defects induced changes in the electronic and optical properties of NiO studied by spectroscopic ellipsometry and first-principles calculations
Native defects in semiconductors play an important role in their optoelectronic properties.
Nickel oxide (NiO) is one of the few wide-gap p-type oxide semiconductors and its …
Nickel oxide (NiO) is one of the few wide-gap p-type oxide semiconductors and its …
Wide gap p-type NiO-Ga2O3 alloy via electronic band engineering
Abstract Gallium oxide (Ga 2 O 3) has gained significant interest in recent years due to its
wide bandgap and related unique properties, making it suitable for many high power and …
wide bandgap and related unique properties, making it suitable for many high power and …
[HTML][HTML] Engineered optical and electrical performance of rf–sputtered undoped nickel oxide thin films for inverted perovskite solar cells
Inverted perovskite solar cells incorporating RF sputtered NiO thin films as a hole transport
layer and window layer are demonstrated. The electrical and optical properties of the NiO …
layer and window layer are demonstrated. The electrical and optical properties of the NiO …
Tunable Electrical and Optical Properties of Nickel Oxide (NiOx) Thin Films for Fully Transparent NiOx–Ga2O3 p–n Junction Diodes
MI Pintor-Monroy, D Barrera… - … Applied Materials & …, 2018 - ACS Publications
One of the major limitations of oxide semiconductors technology is the lack of proper p-type
materials to enable devices such as pn junctions, light-emitting diodes, and photodetectors …
materials to enable devices such as pn junctions, light-emitting diodes, and photodetectors …
Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering
High power impulse magnetron sputtering (HiPIMS) technology has attracted lots of
attention due to its high target ionization rate. This characteristic is desirable in preparing …
attention due to its high target ionization rate. This characteristic is desirable in preparing …
Sputtered Nickel Oxide Hole Transporting Layers for Perovskite Solar Cells
Nickel oxide-based hole transporting layers have been widely adopted for the construction
of pin-structured perovskite solar cells. So far, various techniques have been explored to …
of pin-structured perovskite solar cells. So far, various techniques have been explored to …
Controlled NiOx Defect Engineering to Harnessing Redox Reactions in Perovskite Photovoltaic Cells via Atomic Layer Deposition
Albeit the undesirable attributes of NiO x, such as low conductivity, unmanageable defects,
and redox reactions occurring at the perovskite/NiO x interface, which impede the progress …
and redox reactions occurring at the perovskite/NiO x interface, which impede the progress …
Controlling Carrier Type and Concentration in NiO Films To Enable in Situ PN Homojunctions
MI Pintor-Monroy, BL Murillo-Borjas… - … applied materials & …, 2019 - ACS Publications
The oxygen partial pressure during NiO deposition in reactive sputtering of a Ni target is
used to control its carrier type and concentration, obtaining both n-and p-type films. Carrier …
used to control its carrier type and concentration, obtaining both n-and p-type films. Carrier …