Transparent p-type semiconductors: copper-based oxides and oxychalcogenides

N Zhang, J Sun, H Gong - Coatings, 2019 - mdpi.com
While p-type transparent conducting materials (TCMs) are crucial for many optoelectronic
applications, their performance is still not satisfactory. This has impeded the development of …

Control over charge carrier mobility in the hole transport layer enables fast colloidal quantum dot infrared photodetectors

O Atan, JM Pina, DH Parmar, P **a, Y Zhang… - Nano …, 2023 - ACS Publications
Solution-processed colloidal quantum dots (CQDs) are promising materials for
photodetectors operating in the short-wavelength infrared region (SWIR). Devices typically …

Vacancy defects induced changes in the electronic and optical properties of NiO studied by spectroscopic ellipsometry and first-principles calculations

KO Egbo, CP Liu, CE Ekuma, KM Yu - Journal of Applied Physics, 2020 - pubs.aip.org
Native defects in semiconductors play an important role in their optoelectronic properties.
Nickel oxide (NiO) is one of the few wide-gap p-type oxide semiconductors and its …

Wide gap p-type NiO-Ga2O3 alloy via electronic band engineering

CV Ezeh, KO Egbo, JD Musah, KM Yu - Journal of Alloys and Compounds, 2023 - Elsevier
Abstract Gallium oxide (Ga 2 O 3) has gained significant interest in recent years due to its
wide bandgap and related unique properties, making it suitable for many high power and …

[HTML][HTML] Engineered optical and electrical performance of rf–sputtered undoped nickel oxide thin films for inverted perovskite solar cells

H Lee, YT Huang, MW Horn, SP Feng - Scientific reports, 2018 - nature.com
Inverted perovskite solar cells incorporating RF sputtered NiO thin films as a hole transport
layer and window layer are demonstrated. The electrical and optical properties of the NiO …

Tunable Electrical and Optical Properties of Nickel Oxide (NiOx) Thin Films for Fully Transparent NiOx–Ga2O3 p–n Junction Diodes

MI Pintor-Monroy, D Barrera… - … Applied Materials & …, 2018 - ACS Publications
One of the major limitations of oxide semiconductors technology is the lack of proper p-type
materials to enable devices such as pn junctions, light-emitting diodes, and photodetectors …

Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering

SC Chen, TY Kuo, HC Lin, RZ Chen, H Sun - Applied Surface Science, 2020 - Elsevier
High power impulse magnetron sputtering (HiPIMS) technology has attracted lots of
attention due to its high target ionization rate. This characteristic is desirable in preparing …

Sputtered Nickel Oxide Hole Transporting Layers for Perovskite Solar Cells

Y Lee, SI Seok - Korean Journal of Chemical Engineering, 2024 - Springer
Nickel oxide-based hole transporting layers have been widely adopted for the construction
of pin-structured perovskite solar cells. So far, various techniques have been explored to …

Controlled NiOx Defect Engineering to Harnessing Redox Reactions in Perovskite Photovoltaic Cells via Atomic Layer Deposition

X Yu, C Liu, C Li, C Wang, Y Li, L Liang… - … Applied Materials & …, 2024 - ACS Publications
Albeit the undesirable attributes of NiO x, such as low conductivity, unmanageable defects,
and redox reactions occurring at the perovskite/NiO x interface, which impede the progress …

Controlling Carrier Type and Concentration in NiO Films To Enable in Situ PN Homojunctions

MI Pintor-Monroy, BL Murillo-Borjas… - … applied materials & …, 2019 - ACS Publications
The oxygen partial pressure during NiO deposition in reactive sputtering of a Ni target is
used to control its carrier type and concentration, obtaining both n-and p-type films. Carrier …