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Low-power electronic technologies for harsh radiation environments
Electronic technologies that can operate in harsh radiation environments are important in
space, nuclear and avionic applications. However, radiation-hardened (rad-hard) integrated …
space, nuclear and avionic applications. However, radiation-hardened (rad-hard) integrated …
FCC-hh: The hadron collider: Future circular collider conceptual design report volume 3
A Abada, M Abbrescia, SS AbdusSalam… - The European Physical …, 2019 - Springer
In response to the 2013 Update of the European Strategy for Particle Physics (EPPSU), the
Future Circular Collider (FCC) study was launched as a world-wide international …
Future Circular Collider (FCC) study was launched as a world-wide international …
Radiation effects in a post-Moore world
DM Fleetwood - IEEE Transactions on Nuclear Science, 2021 - ieeexplore.ieee.org
An overview is presented of the significant influences of Moore's Law scaling on radiation
effects on microelectronics, focusing on historical trends and future needs. A number of …
effects on microelectronics, focusing on historical trends and future needs. A number of …
Total-Ionizing-Dose Effects, Border Traps, and 1/f Noise in Emerging MOS Technologies
DM Fleetwood - IEEE Transactions on Nuclear Science, 2020 - ieeexplore.ieee.org
Subthreshold leakage currents and threshold-voltage shifts due to total-ionizing-dose (TID)
irradiation are reviewed briefly for highly scaled devices in emerging MOS technologies …
irradiation are reviewed briefly for highly scaled devices in emerging MOS technologies …
TID degradation mechanisms in 16-nm bulk FinFETs irradiated to ultrahigh doses
T Ma, S Bonaldo, S Mattiazzo… - … on Nuclear Science, 2021 - ieeexplore.ieee.org
This article investigates the total ionizing dose (TID) degradation mechanisms of 16-nm bulk
Si FinFETs at ultrahigh doses. n-and p-FinFETs with several channel lengths are irradiated …
Si FinFETs at ultrahigh doses. n-and p-FinFETs with several channel lengths are irradiated …
Effect of Mole fraction and Fin Material on Performance Parameter of 14 nm Heterojunction Si1-xGex FinFET and Application as an Inverter
S Verma, SL Tripathi - Silicon, 2022 - Springer
This work presents a new SOI 14 nm heterojunction FinFET with Si 1-x Ge x fin for low-
power digital logic circuits. The channel region of the proposed device consists of Si 1-x Ge …
power digital logic circuits. The channel region of the proposed device consists of Si 1-x Ge …
Total-Ionizing-Dose Effects and Low-Frequency Noise in 30-nm Gate-Length Bulk and SOI FinFETs With SiO2/HfO2 Gate Dielectrics
Total-ionizing-dose (TID) effects and low-frequency noise are evaluated in 30-nm gate-
length bulk and silicon-on-insulator (SOI) FinFETs for devices with fin widths of 10-40 nm …
length bulk and silicon-on-insulator (SOI) FinFETs for devices with fin widths of 10-40 nm …
Radiation-induced charge trap** in shallow trench isolations of FinFETs
We provide comprehensive experimental data and technology computer-aided design
(TCAD) simulations to clarify total-ionizing-dose mechanisms in 16-nm Si FinFETs. In n …
(TCAD) simulations to clarify total-ionizing-dose mechanisms in 16-nm Si FinFETs. In n …
Investigating heavy-ion effects on 14-nm process FinFETs: Displacement damage versus total ionizing dose
MG Esposito, JE Manuel, A Privat… - … on Nuclear Science, 2021 - ieeexplore.ieee.org
Bulk 14-nm FinFET technology was irradiated in a heavy-ion environment (42-MeV Si ions)
to study the possibility of displacement damage (DD) in scaled technology devices, resulting …
to study the possibility of displacement damage (DD) in scaled technology devices, resulting …
Performance analysis of FinFET device using qualitative approach for low-power applications
The introduction of Field Effect Transistor (FinFET) Technology played a leading contender
in today microelectronics. FinFET structure allows to scale the device at sub-nanometer …
in today microelectronics. FinFET structure allows to scale the device at sub-nanometer …