Challenges in material processing and reliability issues in AlGaN/GaN HEMTs on silicon wafers for future RF power electronics & switching applications: A critical …

J Ajayan, D Nirmal, P Mohankumar, B Mounika… - Materials Science in …, 2022 - Elsevier
In order to handle high power with good thermal stability at RF & microwave frequencies
wider bandgap semiconductor based transistors are highly desirable and GaN & AlGaN …

HfSe2 and ZrSe2: Two-dimensional semiconductors with native high-κ oxides

MJ Mleczko, C Zhang, HR Lee, HH Kuo… - Science …, 2017 - science.org
The success of silicon as a dominant semiconductor technology has been enabled by its
moderate band gap (1.1 eV), permitting low-voltage operation at reduced leakage current …

High-temperature modeling of algan/gan hemts

S Vitanov, V Palankovski, S Maroldt, R Quay - Solid-State Electronics, 2010 - Elsevier
Wide bandgap, high saturation velocity, and high thermal stability are some of the properties
of GaN, which make it an excellent material for high-power, high-frequency, and high …

Investigation of self-heating effect on DC and RF performances in AlGaN/GaN HEMTs on CVD-diamond

K Ranjan, S Arulkumaran, GI Ng… - IEEE Journal of the …, 2019 - ieeexplore.ieee.org
We have investigated the self-heating effect on DC and RF performances of identically
fabricated AlGaN/GaN HEMTs on CVD-Diamond (GaN/Dia) and Si (GaN/Si) substrates. Self …

Extreme temperature modeling of ALGAN/GAN HEMTS

SA Albahrani, D Mahajan, S Kargarrazi… - … on Electron Devices, 2020 - ieeexplore.ieee.org
The industry standard advanced SPICE model (ASM)-GaN compact model has been
enhanced to model the GaN high electron mobility transistors (HEMTs) at extreme …

Temperature dependence of Ohmic contact characteristics in AlGaN/GaN high electron mobility transistors from− 50 to 200 C

ZH Liu, S Arulkumaran, GI Ng - Applied physics letters, 2009 - pubs.aip.org
The temperature dependent characteristics of Ti/Al/Ni/Au Ohmic contact for AlGaN/GaN high
electron mobility transistors (HEMTs) on high-resistivity Si and sapphire substrates were …

Investigation of trap effects in AlGaN∕ GaN field-effect transistors by temperature dependent threshold voltage analysis

P Kordoš, D Donoval, M Florovič, J Kováč… - Applied Physics …, 2008 - pubs.aip.org
We report on a temperature dependent threshold voltage analysis of the Al Ga N∕ Ga N
heterostructure field-effect transistors (HFETs) and Al 2 O 3∕ Al Ga N∕ Ga N metal-oxide …

Effect of gate-source and gate-drain Si3N4 passivation on current collapse in AlGaN∕ GaN high-electron-mobility transistors on silicon

S Arulkumaran, GI Ng, ZH Liu - Applied physics letters, 2007 - pubs.aip.org
The effects of gate-source (GS) and gate-drain (GD) region passivation on the drain current
(ID) collapse in Al Ga N∕ Ga N high-electron-mobility transistors (HEMTs) were studied …

An improved model to assess temperature-dependent DC characteristics of submicron GaN HEMTs

MN Khan, UF Ahmed, MM Ahmed… - Journal of Computational …, 2018 - Springer
A modified analytical model for the current–voltage (I–V) characteristics of AlGaN/GaN high-
electron-mobility transistors (HEMTs) is presented, considering the temperature …

ZnO-Based n-Channel Junction Field-Effect Transistor With Room-Temperature-Fabricated Amorphous p-Type Gate

FL Schein, H von Wenckstern, H Frenzel… - IEEE electron device …, 2012 - ieeexplore.ieee.org
ZnO-based junction field-effect transistors were fabricated by pulsed-laser deposition using
room-temperature-deposited amorphous p-type ZnCo 2 O 4 as heterojunction gate on top of …