High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …
gained substantial interest among academics and industrials alike. HPPMS, also known as …
The Mn+ 1AXn phases: Materials science and thin-film processing
This article is a critical review of the Mn+ 1AXn phases (“MAX phases”, where n= 1, 2, or 3)
from a materials science perspective. MAX phases are a class of hexagonal-structure …
from a materials science perspective. MAX phases are a class of hexagonal-structure …
High power impulse magnetron sputtering discharge
The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …
A structure zone diagram including plasma-based deposition and ion etching
A Anders - Thin Solid Films, 2010 - Elsevier
An extended structure zone diagram is proposed that includes energetic deposition,
characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high …
characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high …
An introduction to thin film processing using high-power impulse magnetron sputtering
High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized
physical vapor deposition technique and is already making its way to industrial applications …
physical vapor deposition technique and is already making its way to industrial applications …
Magnetron sputtered titanium carbide-based coatings: A review of science and technology
Titanium carbide (TiC) coatings are widely used in several industrial applications, including
tooling and tribological applications. These materials are used due to their mechanical …
tooling and tribological applications. These materials are used due to their mechanical …
On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
High power pulsed magnetron sputtering (HPPMS) is used to deposit CrN films without
external heating at different peak target currents, while the average current is kept constant …
external heating at different peak target currents, while the average current is kept constant …
On the origin of the metastable β-Ta phase stabilization in tantalum sputtered thin films
JJ Colin, G Abadias, A Michel, C Jaouen - Acta Materialia, 2017 - Elsevier
Despite extensive studies since the 1960s, the exact mechanisms underlying phase
formation of metastable tetragonal beta-Tantalum (β-Ta) structure commonly found in …
formation of metastable tetragonal beta-Tantalum (β-Ta) structure commonly found in …
High power pulsed magnetron sputtering: Fundamentals and applications
Direct current magnetron sputtering (dcMS) is a widely used technique for deposition of a
large number of compound and metallic coatings with specified mechanical, electrical and …
large number of compound and metallic coatings with specified mechanical, electrical and …
Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films
K Sarakinos, A Braun, C Zilkens, S Mráz… - Surface and Coatings …, 2012 - Elsevier
Amorphous carbon films are deposited employing high power impulse magnetron sputtering
(HiPIMS) at pulsing frequencies of 250Hz and 1kHz. Films are also deposited by direct …
(HiPIMS) at pulsing frequencies of 250Hz and 1kHz. Films are also deposited by direct …