Sub-10 nm two-dimensional transistors: Theory and experiment

R Quhe, L Xu, S Liu, C Yang, Y Wang, H Li, J Yang… - Physics Reports, 2021 - Elsevier
Presently Si-based field-effect transistors (FETs) are approaching their physical limit, and
further scaling their gate length down to the sub-10 nm region is becoming extremely …

Intercalation as a versatile tool for fabrication, property tuning, and phase transitions in 2D materials

M Rajapakse, B Karki, UO Abu, S Pishgar… - npj 2D Materials and …, 2021 - nature.com
Recent advances in two-dimensional (2D) materials have led to the renewed interest in
intercalation as a powerful fabrication and processing tool. Intercalation is an effective …

Efficient Ohmic contacts and built-in atomic sublayer protection in MoSi2N4 and WSi2N4 monolayers

Q Wang, L Cao, SJ Liang, W Wu, G Wang… - npj 2D Materials and …, 2021 - nature.com
Metal contacts to two-dimensional (2D) semiconductors are often plagued by the strong
Fermi level pinning (FLP) effect which reduces the tunability of the Schottky barrier height …

Applications of phosphorene and black phosphorus in energy conversion and storage devices

J Pang, A Bachmatiuk, Y Yin… - Advanced Energy …, 2018 - Wiley Online Library
The successful isolation of phosphorene (atomic layer thick black phosphorus) in 2014 has
currently aroused the interest of 2D material researchers. In this review, first, the …

Schottky barrier heights in two-dimensional field-effect transistors: from theory to experiment

Y Wang, S Liu, Q Li, R Quhe, C Yang… - Reports on Progress …, 2021 - iopscience.iop.org
Over the past decade, two-dimensional semiconductors (2DSCs) have aroused wide
interest due to their extraordinary electronic, magnetic, optical, mechanical, and thermal …

Van der Waals heterostructures for optoelectronics: Progress and prospects

W Liao, Y Huang, H Wang, H Zhang - Applied Materials Today, 2019 - Elsevier
Over the past decade, van der Waals (vdW) heterostructures has offered considerable
freedom to integrate various two dimensional (2D) layered materials and proved themselves …

Sub-5 nm Monolayer MoS2 Transistors toward Low-Power Devices

H Zhang, B Shi, L Xu, J Yan, W Zhao… - ACS Applied …, 2021 - ACS Publications
Inspired by the recent achievements of the two-dimensional (2D) sub-5 nm MoS2 field effect
transistors (FETs), we use the ab initio quantum-transport methods to simulate the transport …

Performance limit of monolayer MoSi 2 N 4 transistors

X Sun, Z Song, N Huo, S Liu, C Yang, J Yang… - Journal of Materials …, 2021 - pubs.rsc.org
Recently, a novel two-dimensional (2D) MoSi2N4 has been successfully synthesized and
features high carrier mobility, moderate bandgap, and outstanding ambient stability (Science …

Can carbon nanotube transistors be scaled down to the sub-5 nm gate length?

L Xu, J Yang, C Qiu, S Liu, W Zhou, Q Li… - … Applied Materials & …, 2021 - ACS Publications
Single-walled carbon nanotubes (CNTs) have been considered as a promising
semiconductor to construct transistors and integrated circuits in the future owing to their …

High-performance 5.1 nm in-plane Janus WSeTe Schottky barrier field effect transistors

ZQ Fan, ZH Zhang, SY Yang - Nanoscale, 2020 - pubs.rsc.org
Using ab initio quantum-transport simulations, we studied the intrinsic transfer
characteristics and benchmarks of the ballistic performance of 5.1 nm double-gated Schottky …