Featured Application This work finds application in Extreme Ultraviolet (EUV) lithography in
general. More specifically, the results may impact the development of EUV optical …

Since the 1940s, Microwave Cavity Resonance Spectroscopy (MCRS) has been used to
investigate a variety of solids, gases, and low-pressure plasmas. Recently, the working …

This work reports on the measurements of ion flux composition and ion energy distribution
functions (IEDFs) at surfaces in contact with hydrogen plasmas induced by extreme …

Plasmas induced by EUV radiation are unique since they are created without the need of
any discharge. Moreover, it is essential to characterize these plasmas to understand and …

A new diagnostic approach using multi-mode microwave cavity resonance spectroscopy
(MCRS) is introduced. This can be used to determine electron dynamics non-invasively in …

We used numerical modeling to study the evolution of EUV-induced plasmas in argon and
hydrogen. The results of simulations were compared to the electron densities measured by …

Extreme Ultraviolet (EUV) optical components used in EUV lithography tools are
continuously impacted by an exotic and highly transient type of plasma: EUV-induced …

The electron density and effective electron collision frequency in the spatial afterglow of a
pulsed radio frequency driven atmospheric-pressure plasma jet are obtained by using …

With the introduction of Extreme Ultraviolet (EUV) lithography, the control of contamination
has become crucial. Sources for contamination in EUV lithography scanners are not limited …

We monitored—in the pressure range: 0.5–15 Pa—the electron temperature in decaying
plasmas induced in argon gas by pulsed irradiation with extreme ultraviolet (EUV) photons …