Deposit of AlN thin films by nitrogen reactive pulsed laser ablation using an Al target

F Chale-Lara, M Zapata-Torres… - Revista mexicana de …, 2019 - scielo.org.mx
We report the synthesis of AlN hexagonal thin films by pulsed laser ablation, using Al target
in nitrogen ambient over natively-oxidized Si (111) at 600° C. Composition and chemical …

Monolithic Solder-On Nanoporous Si-Cu Contacts for Stretchable Silicone Composite Sensors

M Kasimatis, E Nunez-Bajo, M Grell… - … applied materials & …, 2019 - ACS Publications
We report a method of creating solderable, mechanically robust, electrical contacts to
interface (soft) silicone-based strain sensors with conventional (hard) solid-state electronics …

Temperature interaction of Early voltage, current gain and breakdown characteristics of npn and pnp SiGe HBTs on SOI

JA Babcock, LJ Choi, A Sadovnikov… - 2010 IEEE Bipolar …, 2010 - ieeexplore.ieee.org
We present a comprehensive investigation of temperature dependence of breakdown
voltage, DC current gain (β), and Early voltage (VA) for complementary SiGe-npn and SiGe …

Novel Mobility Enhancement Schemes for Next Generation Silicon Carbide (SiC) Trench MOSFET Technology

PB Vyas, A Pal, S Weeks, J Holt… - … on Simulation of …, 2024 - ieeexplore.ieee.org
New mobility improvement solutions are proposed for next generation SiC trench MOSFET
with higher aspect ratio trenches. A combination of channel counter-implant and pocket …

The impact of scaling on interconnect reliability

C Bruynseraede, Z Tokei, F Iacopi… - 2005 IEEE …, 2005 - ieeexplore.ieee.org
Back-end-of-line (BEOL) reliability, comprising barrier, dielectric and current-carrying metal
reliability, is a major challenge for future IC generations as the reliability margin of the …

Study on the Slurry for Chemical Mechanical Polishing of GaN Wafer

Y Liu, B Zhang, S Qin, Y Wang, W **an… - 2024 Conference of …, 2024 - ieeexplore.ieee.org
The effects of oxidants in acidic and alkaline slurries on the chemical mechanical polishing
(CMP) process of gallium nitride were studied. In order to better understand the …

Revisit resistance monitoring techniques for measuring TSV/Solder resistance during Electromigration test

CM Tan, U Narula - … Conference on Solid-State and Integrated …, 2014 - ieeexplore.ieee.org
TSV and micro-Solder bump are key interconnects for 2.5 D and 3D Integrated circuit (IC)
chips, and being part of interconnects for IC, their Electromigration reliability must be …

Reliability mechanisms and lifetime extrapolation methods for scaled interconnect technologies

K Croes, C Wu, D Kocaay, J Bömmels… - … Conference and 2015 …, 2015 - ieeexplore.ieee.org
We review our current understanding of the degradation mechanisms in scaled
interconnects. Concerns on the applicability of today's reliability evaluation methods are …

Investigation of HVPE grown layers on MOVPE GaN/sapphire templates for application as drift layer in vertical GaN power devices

T **e, M Krupinski, S Jachalke, C Silva… - 2020 13th …, 2020 - ieeexplore.ieee.org
We report our investigations on HVPE grown GaN with thickness of 20 μm on MOVPE
GaN/Sapphire templates. The important characteristics for the proposed electric …

Quasi-omnidirectional anti-reflective structure based on porous silicon dielectric multilayers for the near infrared, visible and middle ultraviolet region of the …

V AGARWAL, ADA FLORES, JSP HUERTA, Y Kumar - 2014 - Google Patents
The invention relates to an antireflective structure based on porous silicon multilayers
stacked in a one-dimensional manner. This layer can reflect less than 4% of incident light at …