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Voltage‐and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review
Sculpting silicon at the micro and nano scales has been game‐changing to mold bulk silicon
properties and expand, in turn, applications of silicon beyond electronics, namely, in …
properties and expand, in turn, applications of silicon beyond electronics, namely, in …
[HTML][HTML] Proton beam writing
Proton beam (p-beam) writing is a new direct-writing process that uses a focused beam of
MeV protons to pattern resist material at nanodimensions. The process, although similar in …
MeV protons to pattern resist material at nanodimensions. The process, although similar in …
[Књига][B] Porous silicon in practice: preparation, characterization and applications
MJ Sailor - 2012 - books.google.com
By means of electrochemical treatment, crystalline silicon can be permeated with tiny,
nanostructured pores that entirely change the characteristics and properties of the material …
nanostructured pores that entirely change the characteristics and properties of the material …
Silicon nanostructures for molecular sensing: a review
This review presents a comprehensive synopsis of the recent developments and
achievements in the research of nanosensors composed of plasmonic nanoparticles (NPs) …
achievements in the research of nanosensors composed of plasmonic nanoparticles (NPs) …
[Књига][B] Radiation defect engineering
K Vitali, V Abrosimova - 2005 - books.google.com
The increasing complexity of problems in semiconductor electronics and optoelectronics has
exposed the insufficient potential of the technological do** processes currently used. One …
exposed the insufficient potential of the technological do** processes currently used. One …
Proton beam writing: a progress review
A new direct write 3D nano lithographic technique has been developed at the Centre for Ion
Beam Applications (CIBA) in the Physics Department of the National University of …
Beam Applications (CIBA) in the Physics Department of the National University of …
3D Free‐Form Patterning of Silicon by Ion Implantation, Silicon Deposition, and Selective Silicon Etching
A method for additive layer‐by‐layer fabrication of arbitrarily shaped 3D silicon micro‐and
nanostructures is reported. The fabrication is based on alternating steps of chemical vapor …
nanostructures is reported. The fabrication is based on alternating steps of chemical vapor …
Hole transport through proton-irradiated -type silicon wafers during electrochemical anodization
The hole current density flowing through and around proton-irradiated areas of p-type silicon
during electrochemical anodization is simulated and studied experimentally using scanning …
during electrochemical anodization is simulated and studied experimentally using scanning …
Toward the formation of three-dimensional nanostructures by electrochemical etching of silicon
P Kleimann, X Badel, J Linnros - Applied Physics Letters, 2005 - pubs.aip.org
We report a simple technique to form various kinds of three-dimensional structures in silicon.
The process flow is only composed of two steps: lithography and electrochemical etching …
The process flow is only composed of two steps: lithography and electrochemical etching …
Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeVproton beam writing with minimal proximity effect
HJ Whitlow, ML Ng, V Auželyté, I Maximov… - …, 2003 - iopscience.iop.org
Metal electrode structures for biosensors with a high spatial density and nm gaps have been
produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl …
produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl …