Polymer integration for packaging of implantable sensors

Y Qin, MMR Howlader, MJ Deen, YM Haddara… - Sensors and Actuators B …, 2014 - Elsevier
Abstract Inexpensive, easy-to-process, light-weight polymer-based materials that are
biocompatible, mechanically flexible, and optically transparent have emerged as …

Fabrication of GaN/diamond heterointerface and interfacial chemical bonding state for highly efficient device design

J Liang, A Kobayashi, Y Shimizu, Y Ohno… - Advanced …, 2021 - Wiley Online Library
The direct integration of gallium nitride (GaN) and diamond holds much promise for high‐
power devices. However, it is a big challenge to grow GaN on diamond due to the large …

Realization of direct bonding of single crystal diamond and Si substrates

J Liang, S Masuya, M Kasu, N Shigekawa - Applied Physics Letters, 2017 - pubs.aip.org
Diamond/Si junctions have been achieved by surface activated bonding method without any
chemical and heating treatments. Bonded interfaces were obtained that were free from voids …

Low-temperature bonding for silicon-based micro-optical systems

Y Qin, MMR Howlader, MJ Deen - Photonics, 2015 - mdpi.com
Silicon-based integrated systems are actively pursued for sensing and imaging applications.
A major challenge to realize highly sensitive systems is the integration of electronic, optical …

Stability of diamond/Si bonding interface during device fabrication process

J Liang, S Masuya, S Kim, T Oishi, M Kasu… - Applied Physics …, 2018 - iopscience.iop.org
Diamond/Si bonding interface with an entire contact area and high thermal stability is
achieved by surface activated bonding method. The fabrication of diamond field-effect …

Annealing effect of surface-activated bonded diamond/Si interface

J Liang, Y Zhou, S Masuya, F Gucmann… - Diamond and Related …, 2019 - Elsevier
From transmission electron microscope (TEM) observation, a 25 nm thick amorphous layer
was confirmed at the diamond/Si bonding interface without annealing, the amorphous layer …

Effects of thermal annealing process on the electrical properties of p+-Si/n-SiC heterojunctions

J Liang, S Nishida, M Arai, N Shigekawa - Applied Physics Letters, 2014 - pubs.aip.org
The effects of thermal annealing process on the interface in p+-Si/n-SiC heterojunctions
fabricated by using surface-activated bonding are investigated. It is found by measuring their …

Investigation on the interface resistance of Si/GaAs heterojunctions fabricated by surface-activated bonding

J Liang, L Chai, S Nishida, M Morimoto… - Japanese Journal of …, 2015 - iopscience.iop.org
The electrical properties of p-GaAs/n+-Si, p+-Si/n-GaAs, p+-GaAs/n+-Si, p+-Si/n+-GaAs, n+-
Si/n+-GaAs, and p+-Si/p+-GaAs junctions fabricated by surface-activated bonding (SAB) …

Nanobonding technology toward electronic, fluidic, and photonic systems integration

MMR Howlader, PR Selvaganapathy… - IEEE Journal of …, 2010 - ieeexplore.ieee.org
In this paper, a review of surface-activation-based nanobonding technology for packaging
and integration is presented. In this paper, the focus will be on nanobonding technology for …

Fast atom beam activated wafer bonds between n-Si and n-GaAs with low resistance

S Essig, F Dimroth - ECS Journal of Solid State Science and …, 2013 - iopscience.iop.org
Fast atom beam activated direct wafer bonds can be used to combine GaAs and Si
semiconductor structures and to achieve high bond strength and optical transparency. Some …