Is poly (Methyl Methacrylate)(PMMA) a suitable substrate for ALD?: A review

MA Forte, RM Silva, CJ Tavares, RF Silva - Polymers, 2021 - mdpi.com
Poly (methyl methacrylate)(PMMA) is a thermoplastic synthetic polymer, which displays
superior characteristics such as transparency, good tensile strength, and processability. Its …

Recent advances in hollow cathode technology for plasma-enhanced ald—plasma surface modifications for aluminum and stainless-steel cathodes

KSA Butcher, V Georgiev, D Georgieva - Coatings, 2021 - mdpi.com
Recent designs have allowed hollow cathode gas plasma sources to be adopted for use in
plasma-enhanced atomic layer deposition with the benefit of lower oxygen contamination for …

Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry

U Kilic, A Mock, D Sekora, S Gilbert, S Valloppilly… - Scientific reports, 2020 - nature.com
We find that a five-phase (substrate, mixed native oxide and roughness interface layer, metal
oxide thin film layer, surface ligand layer, ambient) model with two-dynamic (metal oxide thin …

Spectroscopic study on alternative plasmonic TiN-NRs film prepared by R-HiPIMS with GLAD technique

C Promjantuk, T Lertvanithphol, N Limsuwan… - Radiation Physics and …, 2023 - Elsevier
In this study, we investigate the structural and optical property of alternative plasmonic
titanium nitride nanorods (TiN-NRs) films. The TiN-NRs films were deposited by reactive …

Amidoxime-Containing Ti Precursors for Atomic Layer Deposition of TiN Thin Films with Suppressed Columnar Microstructure

GY Lee, S Yeo, CM Cho, SH Oh, H Park… - Inorganic …, 2023 - ACS Publications
This paper reports the synthesis of three novel titanium complexes containing amidoxime
ligands as potential precursors for titanium nitride (TiN) thin films fabricated using atomic …

Measurement of Young's modulus and residual stress of atomic layer deposited Al2O3 and Pt thin films

F Purkl, A Daus, TS English, J Provine… - Journal of …, 2017 - iopscience.iop.org
The accurate measurement of mechanical properties of thin films is required for the design
of reliable nano/micro-electromechanical devices but is increasingly challenging for …

High-quality SiN x thin-film growth at 300° C using atomic layer deposition with hollow-cathode plasma

JC Park, DH Kim, TJ Seok, DW Kim, JH Ahn… - Journal of Materials …, 2023 - pubs.rsc.org
We report high-quality atomic-layer-deposited SiNx thin films using a novel remote plasma
source, hollow cathode plasma (HCP), at a low temperature of 300° C. SiNx films using the …

Encapsulation of Agrochemicals on Polymeric Microcapsules Coated with Photocatalytic Nanomaterials

MAF Forte - 2022 - search.proquest.com
Excessive use of agricultural land using agrochemicals (AC) for human livelihood results in
excessive pollution of soils and food chains. The nutritional deregulation of soils causes …

Methods to enhance the stability and sensitivity of NEMS biosensors

W Zheng - 2016 - era.library.ualberta.ca
Mass sensitive mechanical resonator based biosensors are a promising label free biological
sensing platform due to the capability for high sensitivity, fast response, accurate and real …

Optoplasmonic Properties of Heterostructure Metamaterials Fabricated Using Glancing Angle and Atomic Layer Deposition Techniques & Analyzed Using Finite …

U Kilic - 2021 - search.proquest.com
Advancements in nanotechnology enable precise manipulation of materials on the atomic or
molecular scale, creating unique material and physical properties compared to their bulk …