New development of atomic layer deposition: processes, methods and applications
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many
applications owing to its distinct abilities. They include uniform deposition of conformal films …
applications owing to its distinct abilities. They include uniform deposition of conformal films …
Speeding up the unique assets of atomic layer deposition
Atomic layer deposition (ALD) has been traditionally regarded as an extremely powerful but
slow thin-film deposition technique. The (perceived) limitation in terms of deposition rate has …
slow thin-film deposition technique. The (perceived) limitation in terms of deposition rate has …
Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si
During the first stages of Atomic Layer Deposition (ALD) of Al 2 O 3 on silicon (Si), the
substrate nature affects the surface chemistry, leading to an initial island growth mode …
substrate nature affects the surface chemistry, leading to an initial island growth mode …
Detailed investigation of the surface mechanisms and their interplay with transport phenomena in alumina atomic layer deposition from TMA and water
The surface mechanisms involved in the Atomic Layer Deposition of Al 2 O 3 from TMA and
H 2 O are investigated by means of combined experimental and computational analyses …
H 2 O are investigated by means of combined experimental and computational analyses …
Towards a mechanistic understanding of the floating catalyst CVD of CNTs: Interplay between catalyst particle nucleation, growth and deactivation
The chemical vapor deposition (CVD) of carbon nanotubes (CNTs) with the floating catalyst
technique, using ferrocene as catalyst, is computationally investigated from its mechanistic …
technique, using ferrocene as catalyst, is computationally investigated from its mechanistic …
Scaling-up of thin-film photoelectrodes for solar water splitting based on atomic layer deposition
Atomic layer deposition (ALD) is an established method to prepare protective layers for Si-
based photoelectrodes for photoelectrochemical (PEC) water splitting. Although ALD has …
based photoelectrodes for photoelectrochemical (PEC) water splitting. Although ALD has …
CFD Simulation of the Dosing Behavior within the Atomic Layer Deposition Feeding System
The effective operation of atomic layer deposition (ALD) feeding system is the premise of
realizing specific ALD processes. In the present work, a detailed computational fluid …
realizing specific ALD processes. In the present work, a detailed computational fluid …
[HTML][HTML] Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor
We have developed a simulation tool to model self-limited processes such as atomic layer
deposition (ALD) and atomic layer etching inside reactors of arbitrary geometry as well the …
deposition (ALD) and atomic layer etching inside reactors of arbitrary geometry as well the …
Transient analysis and process optimization of the spatial atomic layer deposition using the dynamic mesh method
Spatial atomic layer deposition (ALD) is acknowledged as a high-throughput thin film
preparation technique. Since the films are obtained at a high relative velocity of the …
preparation technique. Since the films are obtained at a high relative velocity of the …
Density functional theory (DFT)-enhanced computational fluid dynamics modeling of substrate movement and chemical deposition process in spatial atomic layer …
Spatial atomic layer deposition (ALD) has been widely accepted as an effective strategy to
improve the throughput in traditional ALD. This paper presents a Density Functional Theory …
improve the throughput in traditional ALD. This paper presents a Density Functional Theory …