Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

Atomic layer deposition is widely acknowledged as a powerful technique for the deposition
of high quality layers for several applications including photovoltaics (PV). The capability of …

In this work, a novel engineered biochar prepared through modification with chitosan and
pyromellitic dianhydride (PMDA) was investigated as an adsorbent for the removal of heavy …

This article is a review of recent research and development advances in oxide thin film
transistors (TFTs) fabricated by atomic layer deposition (ALD) processes. The ALD process …

Cu2O is a promising p-type semiconductor for low-cost photovoltaics and transparent
optoelectronics. However, low-cost and low-temperature fabrication of Cu2O films with good …

Abstract Cuprous oxide (Cu 2 O)-based photocathodes have been attracting enduring
interest for green and sustainable solar fuel production by solar-driven photoelectrochemical …

Atomic layer deposition (ALD) relies on self-limiting reaction within a cyclic process and is
being considered as a potential technique for synthesizing nanomaterials with precisely …

As a representative intrinsic p-type inorganic semiconductor material, cuprous oxide (Cu2O)
has been widely used in photovoltaics, catalysis, chemical industries, and other fields …

Metal oxide semiconductors are important due to their diverse set of applications in (opto)
electronics including light-emitting diodes, solar cells, and thin film transistors (TFTs) …

Copper and binary copper oxide thin films are key materials for microelectronic,
optoelectronic, and sensing devices. Herein, we report innovative atmospheric pressure …