Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter

H Hu, M Gopinadhan, CO Osuji - Soft matter, 2014‏ - pubs.rsc.org
Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

[HTML][HTML] Self-assembly of block copolymer thin films

JNL Albert, TH Epps III - Materials Today, 2010‏ - Elsevier
Block copolymers self-assemble on nanometer length scales, making them ideal for
emerging nanotechnologies. Many applications (eg, templating, membranes) require the …

Block copolymer nanolithography: translation of molecular level control to nanoscale patterns

J Bang, U Jeong, DY Ryu, TP Russell… - Advanced …, 2009‏ - Wiley Online Library
Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
Page 1 Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale …

Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu… - Acs Nano, 2007‏ - ACS Publications
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …

Polymer self assembly in semiconductor microelectronics

CT Black, R Ruiz, G Breyta, JY Cheng… - IBM Journal of …, 2007‏ - ieeexplore.ieee.org
We are inspired by the beauty and simplicity of self-organizing materials and the promise
they hold for enabling continued improvements in semiconductor technology. Self assembly …

Block copolymers as a tool for nanomaterial fabrication

M Lazzari, MA López‐Quintela - Advanced Materials, 2003‏ - Wiley Online Library
In this review the latest developments regarding the use of self‐assembled copolymers for
the fabrication of nanomaterials will be presented and their real potential evaluated. Most of …

[HTML][HTML] Block copolymers and conventional lithography

MP Stoykovich, PF Nealey - materials today, 2006‏ - Elsevier
The lithographic process is arguably the key enabling technology for the digital age.
Hundreds of millions of devices can be fabricated on a single chip because patterns with …

Nanoporous materials from block copolymer precursors

MA Hillmyer - Block copolymers II, 2005‏ - Springer
Block copolymers constitute a fascinating set of self-assembled materials exhibiting
compositional heterogeneities on the nanometer length scale. While traditionally employed …

[HTML][HTML] Block copolymer patterns and templates

M Li, CK Ober - Materials Today, 2006‏ - Elsevier
This review describes the chemical and physical aspects of patternable block copolymers
and their use for nanostructure fabrication. The patternability of block copolymers results …

Virus filtration membranes prepared from nanoporous block copolymers with good dimensional stability under high pressures and excellent solvent resistance

SY Yang, J Park, J Yoon, M Ree… - Advanced Functional …, 2008‏ - Wiley Online Library
We introduce a nanoporous membrane suitable for virus filtration with good dimensional
stability under high pressures maintaining high selectivity. The membrane consists of a …