High-throughput and high-accuracy nanofabrication methods are required for the ever-
increasing demand for nanoelectronics, high-density data storage devices, nanophotonics …

This is a topical review on advanced lithographic methods used to create 3D topographies.
We start the discussion with the principal capabilities of grayscale electron beam lithography …

The semiconductor industry has already entered the sub-10 nm region, which has led to the
development of cutting-edge fabrication tools. However, there are other factors that hinder …

A new class of electron bean negative tone resist materials has been developed based on
heterometallic rings. The initial resist performance demonstrates a resolution of 15 nm half …

Given the current need for resist materials for patterning transistors with ultralow nodes,
there has been a quest for develo** resists with improved performance for nanoscale …

In recent time, inorganic and organic-inorganic hybrid resists are gaining considerable
attention of resist community as the presence of inorganic component helps in improving …

We propose a novel mechanism to construct a tunable and ultracompact refractive index
sensor by using the Fano resonance in metal-graphene hybrid nanostructure. Plasmon …

The usability of ZEP520A as resist for thermally activated selective topography equilibration
(TASTE) was investigated. It was found that (i) a high-contrast resist such as ZEP520A is …

CSAR 62 is a new positive tone electron beam resist designed to have similar performance
to ZEP520A in resolution, speed, and etch resistance. In this paper, the authors have used …

Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of
nanoscale devices and structures. For this technique to be effective, the resist material plays …