Thin film is a modern technology aimed at improving the structural, electrical, magnetic,
optical, and mechanical properties of bulk materials. This technology has so far found …

Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many
applications owing to its distinct abilities. They include uniform deposition of conformal films …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Passivation interlayers such as Al2O3 are required to improve the hole selectivity of dopant‐
free passivating contact based on transition metal oxides. For the interlayer to provide low …

Chemical functionalization of silicon oxide (SiO2) surfaces with silane molecules is an
important technique for a variety of device and sensor applications. Quality control of self …

This review provides a comprehensive overview of the most recent progress in chemistry
and applications of metal complexes containing heteroallylic ligands such as amidinates …

The effect of alkaline earth metal (Mg, Ca, and Sr) substitution to LaNi 0.8 Fe 0.2 O 3
perovskite catalyst was investigated for steam reforming of toluene as a model compound of …

Published papers on atomic-scale simulation of the atomic layer deposition (ALD) process
are reviewed. The main topic is reaction mechanism, considering the elementary steps of …

Deposition of thin films with desired compositions, conformality and bonding to substrates is
a key component in nanotechnology research. The growth of metal films by atomic layer …

Atomic layer deposition (ALD) is one of the most promising methodologies available for the
growth of solid thin films conformally on complex topographies and with atomic-level control …