Metal halide perovskites for high‐energy radiation detection

G Kakavelakis, M Gedda, A Panagiotopoulos… - Advanced …, 2020 - Wiley Online Library
Metal halide perovskites (MHPs) have emerged as a frontrunner semiconductor technology
for application in third generation photovoltaics while simultaneously making significant …

Atomic and structural modifications of two-dimensional transition metal dichalcogenides for various advanced applications

B Kirubasankar, YS Won, LA Adofo, SH Choi… - Chemical …, 2022 - pubs.rsc.org
Two-dimensional (2D) transition metal dichalcogenides (TMDs) and their heterostructures
have attracted significant interest in both academia and industry because of their unusual …

High Performance Multilayer MoS2 Transistors with Scandium Contacts

S Das, HY Chen, AV Penumatcha, J Appenzeller - Nano letters, 2013 - ACS Publications
While there has been growing interest in two-dimensional (2-D) crystals other than
graphene, evaluating their potential usefulness for electronic applications is still in its infancy …

Method for manufacturing a low defect interface between a dielectric and a III-V compound

C Merckling - US Patent 8,314,017, 2012 - Google Patents
The present invention is related to a method for manufacturing a low defect interface
between a dielectric material and an III-V compound. More specifically, the present invention …

Comparison of methods to quantify interface trap densities at dielectric/III-V semiconductor interfaces

R Engel-Herbert, Y Hwang, S Stemmer - Journal of applied physics, 2010 - pubs.aip.org
Methods to extract trap densities at high-permittivity (k) dielectric/III-V semiconductor
interfaces and their distribution in the semiconductor band gap are compared. The …

Ultrathin compound semiconductor on insulator layers for high-performance nanoscale transistors

H Ko, K Takei, R Kapadia, S Chuang, H Fang, PW Leu… - Nature, 2010 - nature.com
Over the past several years, the inherent scaling limitations of silicon (Si) electron devices
have fuelled the exploration of alternative semiconductors, with high carrier mobility, to …

High Luminescence Efficiency in MoS2 Grown by Chemical Vapor Deposition

M Amani, RA Burke, X Ji, P Zhao, DH Lien, P Taheri… - ACS …, 2016 - ACS Publications
One of the major challenges facing the rapidly growing field of two-dimensional (2D)
transition metal dichalcogenides (TMDCs) is the development of growth techniques to …

Germanium CMOS potential from material and process perspectives: Be more positive about germanium

A Toriumi, T Nishimura - Japanese Journal of Applied Physics, 2017 - iopscience.iop.org
CMOS miniaturization is now approaching the sub-10 nm level, and further downscaling is
expected. This size scaling will end sooner or later, however, because the typical size is …

Germanium based field-effect transistors: Challenges and opportunities

PS Goley, MK Hudait - Materials, 2014 - mdpi.com
The performance of strained silicon (Si) as the channel material for today's metal-oxide-
semiconductor field-effect transistors may be reaching a plateau. New channel materials …

Germanium MOSFET devices: Advances in materials understanding, process development, and electrical performance

DP Brunco, B De Jaeger, G Eneman… - Journal of The …, 2008 - iopscience.iop.org
Germanium possesses higher electron and hole mobilities than silicon. There is a big leap,
however, between these basic material parameters and implementation for high …