On the potential of SiGe HBTs for extreme environment electronics

JD Cressler - Proceedings of the IEEE, 2005 - ieeexplore.ieee.org
" Extreme environments" represents an important niche market for electronics and spans the
operation of electronic components in surroundings lying outside the domain of …

[LIBRO][B] Silicon Heterostructure Handbook: Materials, Fabrication, Devices, Circuits and Applications of SiGe and Si Strained-Layer Epitaxy

JD Cressler, S Monfray, G Freeman, D Friedman… - 2018 - taylorfrancis.com
An extraordinary combination of material science, manufacturing processes, and innovative
thinking spurred the development of SiGe heterojunction devices that offer a wide array of …

[LIBRO][B] Applications of silicon-germanium heterostructure devices

CK Maiti, GA Armstrong - 2001 - taylorfrancis.com
The first book to deal with the design and optimization of transistors made from strained
layers, Applications of Silicon-Germanium Heterostructure Devices combines three distinct …

Low temperature chemical vapor deposition growth of β-SiC on (100) Si using methylsilane and device characteristics

CW Liu, JC Sturm - Journal of applied physics, 1997 - pubs.aip.org
The growth properties of β-SiC on (100) Si grown by rapid thermal chemical vapor
deposition, using a single precursor (methylsilane) without an initial surface carbonization …

Silicon: germanium-based mixed-signal technology for optimization of wired and wireless telecommunications

BS Meyerson - IBM Journal of Research and Development, 2000 - ieeexplore.ieee.org
The need to serve the explosion in data bandwidth demand for fixed and mobile
applications has driven transistor performance requirements beyond the reach of …

Emerging SiGe HBT reliability issues for mixed-signal circuit applications

JD Cressler - IEEE Transactions on Device and Materials …, 2004 - ieeexplore.ieee.org
We review the emerging reliability issues associated with high-performance SiGe HBT
technologies which are being increasingly deployed in a wide variety of mixed-signal circuit …

Suppression of boron outdiffusion in SiGe HBTs by carbon incorporation

LD Lanzerotti, JC Sturm, E Stach, R Hull… - International …, 1996 - ieeexplore.ieee.org
A key problem faced by npn SiGe technology is the outdiffusion of boron from the SiGe base
caused by thermal annealing or transient enhanced diffusion. In this paper we investigate …

Suppression of boron transient enhanced diffusion in SiGe heterojunction bipolar transistors by carbon incorporation

LD Lanzerotti, JC Sturm, E Stach, R Hull… - Applied physics …, 1997 - pubs.aip.org
In this work, we demonstrate that the incorporation of carbon in the base of a npn Si/SiGe/Si
heterojunction bipolar transistor dramatically reduces the outdiffusion of boron from the base …

[LIBRO][B] SiGe and Si strained-layer epitaxy for silicon heterostructure devices

JD Cressler - 2017 - books.google.com
What seems routine today was not always so. The field of Si-based heterostructures rests
solidly on the shoulders of materials scientists and crystal growers, those purveyors of the …

The effect of carbon on the valence band offset of compressively strained /(100) Si heterojunctions

CL Chang, A St. Amour, JC Sturm - Applied physics letters, 1997 - pubs.aip.org
Capacitance–voltage measurements have been used to study the effect of carbon on the
valence band offset of compressively strained Si 1− x− y Ge x C y/(100) Si heterojunctions …