Optical reflection, or in other words the loss of reflection, from a surface becomes
increasingly crucial in determining the extent of the light-matter interaction. The simplest …

A review of recent progress on the fabrication of biomimetic antireflective surfaces is
presented, with a particular emphasis on antireflective surfaces of silicon and fused silica …

An ordered anodic porous alumina membrane has been used as a lithographic mask of SF
6 fast atom beam etching to generate a 100 nm period antireflection structure on a silicon …

Photolithography is one of the most commonly used techniques in semiconductor
manufacturing, which is the foundation for all the modern electronic device fabrication …

Various optical elements with subwavelength structured surfaces have been developed. The
periods of the subwavelength structures are too short to generate diffracted light waves. But …

We investigate theoretically and experimentally transmission color filters using silicon
subwavelength gratings on quartz substrates. Each grating area is 120 mum-square, which …

Sample preparation: Semi-insulated, single-side polished GaAs (100) wafers (Wafer
Technology Ltd., UK) were cleaned with acetone, methanol, and deionized water prior to the …

This paper reports solutions to the issues of profile control, microloading effect and
suppression of the sidewall roughness of submicrometer trenches by modifying the regular …

We report an innovative approach for the fabrication of highly light transmissive,
antireflective optical interfaces. This is possible due to the discovery that metallic …

An antireflection surface with sub-wavelength structure has been successfully fabricated on
a fused silica substrate. The fabricated antireflection structured surface consists of a …