3-D ICs: A novel chip design for improving deep-submicrometer interconnect performance and systems-on-chip integration

K Banerjee, SJ Souri, P Kapur… - Proceedings of the …, 2001‏ - ieeexplore.ieee.org
Performance of deep-submicrometer very large scale integrated (VLSI) circuits is being
increasingly dominated by the interconnects due to decreasing wire pitch and increasing die …

Activated chemical process for enhancing material properties of dielectric films

SJ Weigel, ML O'neill, RN Vrtis, D Sinatore - US Patent 7,500,397, 2009‏ - Google Patents
(57) ABSTRACT A method for restoring a dielectric constant of a layer of a silicon-containing
dielectric material having a first dielectric constant and at least one Surface, wherein the first …

Multiple Si layer ICs: Motivation, performance analysis, and design implications

SJ Souri, K Banerjee, A Mehrotra… - Proceedings of the 37th …, 2000‏ - dl.acm.org
Continuous scaling of VLSI circuits is reducing gate delays but rapidly increasing
interconnect delays. Semiconductor Industry Association (SIA) roadmap predicts that …

High-performance interconnects: An integration overview

RH Havemann, JA Hutchby - Proceedings of the IEEE, 2001‏ - ieeexplore.ieee.org
The Information Revolution and enabling era of silicon ultralarge-scale integration (ULSI)
have spawned an ever-increasing level of functional integration on-chip, driving a need for …

[كتاب][B] Interconnect Performance in 3-Dimensional Integrated Circuits

SJ Souri - 2003‏ - search.proquest.com
The speed of deep submicron very large scale integrated circuits is being increasingly
dominated by interconnects due to decreasing wire pitch, increasing circuit complexity and …

[PDF][PDF] Getting to the bottom of deep submicron

D Sylvester, K Keutzer - Proceedings of the 1998 IEEE/ACM international …, 1998‏ - dl.acm.org
The magnitude of the difficukies associated with the plunge of circuit design into deep
subrnicron@ Sh~ process geometries has been the source of much speculation. One …

Tunneling-based SRAM

JPA van der Wagt - Proceedings of the IEEE, 1999‏ - ieeexplore.ieee.org
This paper describes a new high-density low-power circuit approach for implementing static
random access memory (SRAM) using low current density resonant tunneling diodes …

Analytical modeling and characterization of deep-submicrometer interconnect

D Sylvester, C Wu - Proceedings of the IEEE, 2001‏ - ieeexplore.ieee.org
This work addresses two fundamental concepts regarding deep-submicrometer
interconnect. First, characterization of on-chip interconnect is considered with particular …

Compact modeling and SPICE-based simulation for electrothermal analysis of multilevel ULSI interconnects

TY Chiang, K Banerjee… - IEEE/ACM International …, 2001‏ - ieeexplore.ieee.org
Presents both compact analytical models and fast SPICE based 3-D electro-thermal
simulation methodology to characterize thermal effects due to Joule heating in high …

Thermal stress characteristics of Cu/oxide and Cu/low-k submicron interconnect structures

SH Rhee, Y Du, PS Ho - Journal of Applied Physics, 2003‏ - pubs.aip.org
Thermal stress characteristics of single damascene Cu lines passivated with tetraethyl
orthosilicate oxide and methyl silsesquioxane low-k dielectrics were investigated by x-ray …