In this paper, the experimental methodology for the single-crystal circular plate deformation
measurement and subsequent procedure for the quantitation of its mechanical properties …

We present the experimental investigations of extreme ultraviolet (EUV) radiation of laser-
produced plasma based on the micro-structured Gd target and obtain a strong EUV radiation …

Thin-layer Al/MgF2 coatings are currently used for extraterrestrial far-UV astronomy as the
primary and secondary mirrors of telescopes (such as “Spektr-UF”). Successful Hubble far …

Extreme-ultraviolet lithography uses a Mo/Si multilayer mirror as an optical unit to produce
nanochips in a semiconductor fabrication plant. The Mo/Si multilayer mirror radiates an …

Monolayer boron and B/Mo/B/Mo coatings were prepared by reactive magnetron sputtering
in the N 2/Ar atmosphere with different RF powers, and the effect of the N 2: Ar flow ratio was …

In 2019, EUV lithography technology with a wavelength of 13.5 nm was first applied to mass
production of 7 nm+ node logic devices. In the future, since semiconductor devices with …

This study proposes a new approach to periodic multilayer mirrors (PMMs) characterizations
based on measured X-ray reflectivity (XRR) data. Here, XRR data are used to reconstruct …

<? TeX-2pc-0pc?> We report on determining the optical constants of Ta in the sub-extreme
ultraviolet (EUV) spectral range 5.0–24.0 nm from the angle-dependent reflectance (ADR) …

A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-
power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma …

Parabolic multilayers (PMs) are widely used in synchrotron radiation, X-ray free electron
lasers, laboratory X-ray sources, and so on, and therefore, how to expediently and effectively …