Presence and origin of interface charges at atomic-layer deposited Al2O3/III-nitride heterojunctions

S Ganguly, J Verma, G Li, T Zimmermann… - Applied physics …, 2011‏ - pubs.aip.org
Unlike silicon and traditional III-V semiconductors, the III-nitrides exhibit high spontaneous
and piezoelectric polarization charges at epitaxial polar heterojunctions. In the process of …

Electrical and microstructural properties of thermally annealed Ni/Au and Ni/Pt/Au Schottky contacts on AlGaN/GaN heterostructures

B Ofuonye, J Lee, M Yan, C Sun, JM Zuo… - Semiconductor …, 2014‏ - iopscience.iop.org
High work-function metals such as Ni, Pt, and Au in the form of multilayer structures, Ni/Au
and Ni/Pt/Au, have been investigated as Schottky metallizations on AlGaN/GaN …

Microscopic Origin of Polarization Charges at / Interfaces

SH Yoo, M Todorova, J Neugebauer… - Physical Review Applied, 2023‏ - APS
Ga N/(Al, Ga) N heterojunctions are at the heart of high-electron-mobility transistors that are
being adopted for high-power and high-frequency applications. The strong polarization …

High uniformity normally-OFF GaN MIS-HEMTs fabricated on ultra-thin-barrier AlGaN/GaN heterostructure

S Huang, X Liu, X Wang, X Kang… - IEEE Electron …, 2016‏ - ieeexplore.ieee.org
Ultra-thin-barrier (UTB) AlGaN/GaN heterostructure is utilized for fabrication of normally-OFF
GaN metal–insulator–semiconductor high-electron-mobility transistors (MIS-HEMTs). The …

210-GHz InAlN/GaN HEMTs with dielectric-free passivation

R Wang, G Li, O Laboutin, Y Cao… - IEEE electron device …, 2011‏ - ieeexplore.ieee.org
Lattice-matched depletion-mode InAlN/AlN/GaN high-electron mobility transistors (HEMTs)
on a SiC substrate were fabricated, for the first time, with a dielectric-free passivation (DFP) …

InAlN/GaN HEMT on Si with fmax= 270 GHz

P Cui, M Jia, H Chen, G Lin, J Zhang… - … on Electron Devices, 2021‏ - ieeexplore.ieee.org
Device surface properties are critical for its performance such as channel electron density,
leakage current, subthreshold swing (SS), and noise in gallium nitride high-electron-mobility …

Oxidation and the origin of the two-dimensional electron gas in AlGaN/GaN heterostructures

MS Miao, JR Weber, CG Van de Walle - Journal of Applied Physics, 2010‏ - pubs.aip.org
The surface of the AlGaN barrier layer in AlGaN/GaN high electron mobility transistors has
strong and hitherto unexplained effects on transistor characteristics. Indeed, it has been …

Extraction of AlGaN/GaN heterostructure Schottky diode barrier heights from forward current-voltage characteristics

Y Lv, Z Lin, TD Corrigan, J Zhao, Z Cao… - Journal of Applied …, 2011‏ - pubs.aip.org
Ni Schottky contacts on AlGaN/GaN heterostructures have been fabricated, and one of the
prepared samples has been annealed at 700 C for half an hour. The barrier heights for the …

Investigation of the interface between LPCVD-SiNx gate dielectric and III-nitride for AlGaN/GaN MIS-HEMTs

Z Liu, S Huang, Q Bao, X Wang, K Wei… - Journal of Vacuum …, 2016‏ - pubs.aip.org
The interface between silicon nitride (SiN x) gate dielectric grown by low pressure chemical
vapor deposition (LPCVD) and III-nitride heterostructure is investigated by a systematical …

Enhancement-mode AlN/GaN HFETs using Cat-CVD SiN

M Higashiwaki, T Mimura… - IEEE Transactions on …, 2007‏ - ieeexplore.ieee.org
High-performance enhancement-mode (E-mode) AIN (2.5 nm)/GaN heterostructure field-
effect transistors (HFETs) were fabricated with a novel method using SiN passivation by …