Atomic layer deposition of stable 2D materials

W Hao, C Marichy, C Journet - 2D Materials, 2018 - iopscience.iop.org
Following the graphene isolation, strong interest in two dimensional (2D) materials has been
driven by their outstanding properties. Their typical intrinsic structure, including strong in …

Atomic layer deposition of two-dimensional layered materials: processes, growth mechanisms, and characteristics

J Cai, X Han, X Wang, X Meng - Matter, 2020 - cell.com
Since the discovery of graphene, there has been an ever-increasing interest in two-
dimensional (2D) layered materials with exceptional properties. To this end, a variety of …

Recent developments in molecular precursors for atomic layer deposition

AL Johnson, JD Parish - 2018 - books.rsc.org
One field of organometallic and materials chemistry that has seen great advancements over
the last 20 years is that of atomic layer deposition (ALD), and in particular the development …

Tunability of near infrared opto-synaptic properties of thin MoO3 films fabricated by atomic layer deposition

H Xu, MK Akbari, S Wang, S Chen, E Kats… - Applied Surface …, 2022 - Elsevier
Thin MoO 3 films with different thickness at nanoscale were fabricated by atomic layer
deposition technique over Au electrodes on the Si/SiO 2 wafers. Bis (t-butylimido) bis …

[HTML][HTML] Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing

M Mattinen, PJ King, L Khriachtchev, MJ Heikkilä… - Materials today …, 2018 - Elsevier
Molybdenum forms a range of oxides with different stoichiometries and crystal structures,
which lead to different properties and performance in diverse applications. Herein …

Nano-thickness dependence of supercapacitor performance of the ALD-fabricated two-dimensional WO3

Z Hai, MK Akbari, Z Wei, C Xue, H Xu, J Hu… - Electrochimica …, 2017 - Elsevier
Abstract Effect of nano-thickness of the two-dimensional (2D) WO 3 electrodes on their
supercapacitor performance was investigated at the nanometers' thickness level. The 2D …

Wafer-scaled monolayer WO3 windows ultra-sensitive, extremely-fast and stable UV-A photodetection

Z Hai, MK Akbari, C Xue, H Xu, L Hyde… - Applied Surface Science, 2017 - Elsevier
The monolayer WO 3-based UV-A photodetectors, fabricated by atomic layer deposition
(ALD) technique at the large area of SiO 2/Si wafer, have demonstrated vastly improved …

Origin of Decomposition in a Family of Molybdenum Precursor Compounds

MA Land, G Bacic, KN Robertson, ST Barry - Inorganic Chemistry, 2022 - ACS Publications
The bis (tert-butylimido)-molybdenum (VI) framework has been used successfully in the
design of vapor-phase precursors for molybdenum-containing thin films, so understanding …

Thermal Selective Vapor Etching of TiO2: Chemical Vapor Etching via WF6 and Self-Limiting Atomic Layer Etching Using WF6 and BCl3

PC Lemaire, GN Parsons - Chemistry of Materials, 2017 - ACS Publications
Controlled thin film etching is essential for further development of sub-10 nm semiconductor
devices. Vapor-phase thermal etching of oxides is appealing for achieving highly conformal …

Atomic layer deposition-enabled single layer of tungsten trioxide across a large area

S Zhuiykov, L Hyde, Z Hai, MK Akbari, E Kats… - Applied Materials …, 2017 - Elsevier
Reduction from multi-layer to one fundamental layer thickness represents a variety of exotic
properties and distinctive applications of such two-dimensional (2D) semiconductor as …