Highly effective activation of Mg-implanted p-type GaN by ultra-high-pressure annealing

H Sakurai, M Omori, S Yamada, Y Furukawa… - Applied Physics …, 2019‏ - pubs.aip.org
A high activation ratio of acceptors to Mg ions implanted into a homoepitaxial GaN layer was
achieved through an ultra-high-pressure annealing (UHPA) process. Capless annealing …

[HTML][HTML] Progress on and challenges of p-type formation for GaN power devices

T Narita, H Yoshida, K Tomita, K Kataoka… - Journal of Applied …, 2020‏ - pubs.aip.org
The fabrication processes of p-type regions for vertical GaN power devices are investigated.
A p-type body layer in a trench gate metal-oxide-semiconductor field-effect transistor …

Study of minority carrier traps in p-GaN gate HEMT by optical deep level transient spectroscopy

J Chen, W Huang, H Qu, Y Zhang, J Zhou… - Applied Physics …, 2022‏ - pubs.aip.org
Properties of minority carrier (electron) traps in Schottky type p-GaN gate high electron
mobility transistors were explicitly investigated by optical deep level transient spectroscopy …

Defect evolution in Mg ions implanted GaN upon high temperature and ultrahigh N2 partial pressure annealing: Transmission electron microscopy analysis

K Iwata, H Sakurai, S Arai, T Nakashima… - Journal of Applied …, 2020‏ - pubs.aip.org
Defects in Mg ion-implanted GaN epitaxial layers formed after annealing at 1573 K and at
1753 K were analyzed by transmission electron microscopy. Degradation of the GaN …

Improved minority carrier lifetime in p-type GaN segments prepared by vacancy-guided redistribution of Mg

K Shima, R Tanaka, S Takashima, K Ueno… - Applied Physics …, 2021‏ - pubs.aip.org
To accelerate the development of GaN power devices, reproducible fabrication of p-type
GaN (p-GaN) segments by ion-implantation (I/I) that enables selective-area do** is …

Effect of AlGaN undershell on the cathodoluminescence properties of coaxial GaInN/GaN multiple-quantum-shells nanowires

W Lu, N Sone, N Goto, K Iida, A Suzuki, DP Han… - Nanoscale, 2019‏ - pubs.rsc.org
Coaxial GaInN/GaN multiple-quantum-shells (MQSs) nanowires (NWs) were grown on an n-
type GaN/sapphire template employing selective growth by metal–organic chemical vapour …

[HTML][HTML] Impacts of vacancy complexes on the room-temperature photoluminescence lifetimes of state-of-the-art GaN substrates, epitaxial layers, and Mg-implanted …

SF Chichibu, K Shima, A Uedono, S Ishibashi… - Journal of Applied …, 2024‏ - pubs.aip.org
For rooting the development of GaN-based optoelectronic devices, understanding the roles
of midgap recombination centers (MGRCs), namely, nonradiative recombination centers and …

Realization of p-type gallium nitride by magnesium ion implantation for vertical power devices

YT Shi, FF Ren, WZ Xu, X Chen, J Ye, L Li, D Zhou… - Scientific Reports, 2019‏ - nature.com
Implementing selective-area p-type do** through ion implantation is the most attractive
choice for the fabrication of GaN-based bipolar power and related devices. However, the low …

Improved midgap recombination lifetimes in GaN crystals grown by the low-pressure acidic ammonothermal method

K Shima, K Kurimoto, Q Bao, Y Mikawa, M Saito… - Applied Physics …, 2024‏ - pubs.aip.org
To investigate the carrier recombination processes in GaN crystals grown by the low-
pressure acidic ammonothermal (LPAAT) method, the photoluminescence (PL) spectra and …

Annealing behavior of vacancy‐type defects in Mg‐and H‐implanted GaN studied using monoenergetic positron beams

A Uedono, H Iguchi, T Narita, K Kataoka… - … status solidi (b), 2019‏ - Wiley Online Library
Vacancy‐type defects in Mg‐implanted GaN with and without hydrogen (H) implantation are
probed by using monoenergetic positron beams. Mg+ and H+ ions are implanted into GaN …