Material science and device physics in SiC technology for high-voltage power devices
T Kimoto - Japanese Journal of Applied Physics, 2015 - iopscience.iop.org
Power semiconductor devices are key components in power conversion systems. Silicon
carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable …
carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable …
Review and analysis of SiC MOSFETs' ruggedness and reliability
J Wang, X Jiang - IET Power Electronics, 2020 - Wiley Online Library
SiC MOSFETs (silicon carbide metal‐oxide semiconductor field‐effect transistors) are
replacing Si insulated gate bipolar transistors in many power conversion applications due to …
replacing Si insulated gate bipolar transistors in many power conversion applications due to …
Basic mechanisms of threshold-voltage instability and implications for reliability testing of SiC MOSFETs
A review of the basic mechanisms affecting the stability of the threshold voltage in response
to a bias-temperature stress is presented in terms of the charging and activation of near …
to a bias-temperature stress is presented in terms of the charging and activation of near …
[HTML][HTML] Silicon carbide: A unique platform for metal-oxide-semiconductor physics
A sustainable energy future requires power electronics that can enable significantly higher
efficiencies in the generation, distribution, and usage of electrical energy. Silicon carbide …
efficiencies in the generation, distribution, and usage of electrical energy. Silicon carbide …
Time dependence of bias-stress-induced SiC MOSFET threshold-voltage instability measurements
We have observed significant instability in the threshold voltage of 4H-SiC metal-oxide-
semiconductor field-effect transistors due to gate-bias stressing. This effect has a strong …
semiconductor field-effect transistors due to gate-bias stressing. This effect has a strong …
Silica on silicon carbide
Silicon carbide (SiC) as both the most important non-oxide ceramic and promising
semiconductor material grows stoichiometric SiO 2 as its native oxide. During passive …
semiconductor material grows stoichiometric SiO 2 as its native oxide. During passive …
Generation of very fast states by nitridation of the SiO2/SiC interface
Fast states at SiO 2/SiC interfaces annealed in NO at 1150–1350 C have been investigated.
The response frequency of the interface states was measured by the conductance method …
The response frequency of the interface states was measured by the conductance method …
Interface properties of metal–oxide–semiconductor structures on 4H-SiC {0001} and (1120) formed by N2O oxidation
T Kimoto, Y Kanzaki, M Noborio… - Japanese journal of …, 2005 - iopscience.iop.org
Abstract 4H-SiC (0001),(0001), and (1120) have been directly oxidized by N 2 O at 1300 C,
and metal–oxide–semiconductor (MOS) interfaces have been characterized. The interface …
and metal–oxide–semiconductor (MOS) interfaces have been characterized. The interface …
Design and formation of SiC (0001)/SiO2 interfaces via Si deposition followed by low-temperature oxidation and high-temperature nitridation
We report an effective approach to reduce defects at a SiC/SiO 2 interface. Since oxidation
of SiC may inevitably lead to defect creation, the idea is to form the interface without …
of SiC may inevitably lead to defect creation, the idea is to form the interface without …
Advanced processing for mobility improvement in 4H-SiC MOSFETs: A review
This paper reviews advanced gate dielectric processes for SiC MOSFETs. The poor quality
of the SiO 2/SiC interface severely limits the value of the channel field-effect mobility …
of the SiO 2/SiC interface severely limits the value of the channel field-effect mobility …