High frequency, high efficiency, and high power density GaN-based LLC resonant converter: State-of-the-art and perspectives

SA Mortazavizadeh, S Palazzo, A Amendola… - Applied Sciences, 2021 - mdpi.com
Soft switching for both primary and secondary side devices is available by using LLC
converters. This resonant converter is an ideal candidate for today's high frequency, high …

First demonstration of optically-controlled Vertical GaN finFET for Power Applications

JH Hsia, JA Perozek, T Palacios - IEEE Electron Device Letters, 2024 - ieeexplore.ieee.org
In this work, we propose a novel optically-controlled vertical GaN finFET directly triggered by
low-power ultraviolet (UV) illumination. The proposed device consists of a normally-off …

Impact of composition and thickness of step-graded AlGaN barrier in AlGaN/GaN heterostructures

H Liu, H Huang, K Wang, Z **e, H Wang - Materials Science in …, 2024 - Elsevier
We propose an optimization method to change the Al component and the thickness of step-
graded AlGaN barrier to achieve better electrical performance of the device. Based on the …

Light-triggered, enhancement-mode AlInN/GaN HEMTs with sub-microsecond switching times

E Palmese, H Xue, DJ Rogers… - IEEE Electron Device …, 2024 - ieeexplore.ieee.org
Light-triggered, AlInN/GaN high-electron-mobility transistors (HEMTs) are presented.
Selective thermal oxidation of the AlInN barrier between the source and drain depletes the …

Research of single-event burnout and hardened GaN MISFET with embedded PN junction

XX Fei, Y Wang, X Luo, MT Bao, CH Yu, XJ Li - Microelectronics Reliability, 2020 - Elsevier
This paper describes a single-event burnout (SEB) simulation for a conventional GaN
MISFET field plate (FPC-MISFET) and a MISFET with an embedded pn junction (EJ …

Optically triggered AlGaN/GaN semiconductor power transistor with bi-layer anti-reflecting structure

SK Pandey, S Rajput, V Kaushik, RD Mishra… - Optical …, 2023 - spiedigitallibrary.org
An optical controlled AlGaN/GaN semiconductor power transistor with a low on-resistance
normally off high electron mobility two-dimensional electron gas (2DEG) channel is …

TCAD simulation of a breakdown-enhanced double channel GaN metal–insulator–semiconductor field-effect transistor with a P-buried layer

XX Fei, Y Wang, X Luo, MT Bao… - … Science and Technology, 2020 - iopscience.iop.org
This paper proposes a new breakdown-enhanced gallium nitride (GaN) metal–insulator–
semiconductor field-effect transistor (MISFET) with the architecture of a double channel and …

Achievement of polarity reversion from Al (Ga)-polar to N-polar for AlGaN film on AlN seeding layer grown by a novel flow‐modulation technology

J Zhang, X Zhang, A Fan, S Chen, J He, A Nasir… - Journal of Materials …, 2021 - Springer
N-polar AlGaN epi-layer was realized on AlN seeding layer grown with a novel flow-
modulation method. The polarity reversion from Al (Ga)-polar to N-polar for AlGaN/AlN films …

Potential study of the enhanced breakdown voltage GaN MISFET based on partial AlN buried layer

XX Fei, Y Wang, X Luo, F Cao, CH Yu - Superlattices and Microstructures, 2018 - Elsevier
In this paper, a new structure for GaN MISFET is proposed to enhance its breakdown
voltage. The proposed structure uses an Aluminum nitride (AlN) buried layer embedded …

Annealing modulated microstructural and electrical properties of plasma-enhanced atomic layer deposition-derived HfO2/SiO2 nanolaminates on AlGaN/GaN

B Wang, Y Li, M Chen, D Cao, F Liu… - Journal of Vacuum …, 2024 - pubs.aip.org
In current work, HfO 2/SiO 2 nanolaminates and HfO 2 films were grown on AlGaN/GaN
substrates via plasma-enhanced atomic layer deposition. A comparative study of how rapid …