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[HTML][HTML] Ferroelectric field effect transistors for electronics and optoelectronics
Ferroelectric materials have shown great value in the modern semiconductor industry and
are considered important function materials due to their high dielectric constant and tunable …
are considered important function materials due to their high dielectric constant and tunable …
Ferroelectric negative capacitance
The capacitor is a key element of electronic devices and is characterized by positive
capacitance. However, a negative capacitance (NC) behaviour may occur in certain cases …
capacitance. However, a negative capacitance (NC) behaviour may occur in certain cases …
[HTML][HTML] Next generation ferroelectric materials for semiconductor process integration and their applications
Ferroelectrics are a class of materials that possess a variety of interactions between
electrical, mechanical, and thermal properties that have enabled a wealth of functionalities …
electrical, mechanical, and thermal properties that have enabled a wealth of functionalities …
Negative capacitance in a ferroelectric capacitor
The Boltzmann distribution of electrons poses a fundamental barrier to lowering energy
dissipation in conventional electronics, often termed as Boltzmann Tyranny,,,,. Negative …
dissipation in conventional electronics, often termed as Boltzmann Tyranny,,,,. Negative …
Sustained Sub-60 mV/decade Switching via the Negative Capacitance Effect in MoS2 Transistors
It has been shown that a ferroelectric material integrated into the gate stack of a transistor
can create an effective negative capacitance (NC) that allows the device to overcome …
can create an effective negative capacitance (NC) that allows the device to overcome …
Ferroelectric negative capacitance field effect transistor
With the progress in silicon circuit miniaturization, lowering power consumption becomes the
major objective. Supply voltage scaling in ultralarge‐scale integration (ULSI) is limited by …
major objective. Supply voltage scaling in ultralarge‐scale integration (ULSI) is limited by …
Sub-5 nm Monolayer MoS2 Transistors toward Low-Power Devices
Inspired by the recent achievements of the two-dimensional (2D) sub-5 nm MoS2 field effect
transistors (FETs), we use the ab initio quantum-transport methods to simulate the transport …
transistors (FETs), we use the ab initio quantum-transport methods to simulate the transport …
Integration of ferroelectric materials: an ultimate solution for next-generation computing and storage devices
R Khosla, SK Sharma - ACS applied electronic materials, 2021 - ACS Publications
Over the decades since ferroelectricity was revealed, ferroelectric materials have emerged
as a cornerstone for a wide spectrum of semiconductor technology and electronic device …
as a cornerstone for a wide spectrum of semiconductor technology and electronic device …
Analysis and compact modeling of negative capacitance transistor with high ON-current and negative output differential resistance—Part II: Model validation
In this paper, we show a validation of our compact model for negative capacitance FET
(NCFET) presented in Part I. The model is thoroughly validated with the TCAD simulations …
(NCFET) presented in Part I. The model is thoroughly validated with the TCAD simulations …
Room-temperature negative capacitance in a ferroelectric–dielectric superlattice heterostructure
We demonstrate room-temperature negative capacitance in a ferroelectric–dielectric
superlattice heterostructure. In epitaxially grown superlattice of ferroelectric BSTO (Ba0 …
superlattice heterostructure. In epitaxially grown superlattice of ferroelectric BSTO (Ba0 …