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A review of thermal processing in the subsecond range: semiconductors and beyond
L Rebohle, S Prucnal, W Skorupa - Semiconductor Science and …, 2016 - iopscience.iop.org
Thermal processing in the subsecond range comprises modern, non-equilibrium annealing
techniques which allow various material modifications at the surface without affecting the …
techniques which allow various material modifications at the surface without affecting the …
Flash lamp annealing
L Rebohle, S Prucnal, D Reichel - Springer Series in Materials Science …, 2019 - Springer
The idea to write a book about flash lamp annealing (FLA) was born when we collected
material for recent review papers [1–3]. It appeared that on the one hand sufficient …
material for recent review papers [1–3]. It appeared that on the one hand sufficient …
Structure and luminescence evolution of annealed Europium-doped silicon oxides films
D Li, X Zhang, L **, D Yang - Optics express, 2010 - opg.optica.org
Europium (Eu)-doped silicon oxide films with Eu concentrations from 2.1 to 4.7 at.% were
deposited by electron beam evaporation. The Eu related luminescence from the films was …
deposited by electron beam evaporation. The Eu related luminescence from the films was …
Optimal composition of europium gallium oxide thin films for device applications
P Wellenius, ER Smith, SM LeBoeuf… - Journal of Applied …, 2010 - pubs.aip.org
Europium gallium oxide (Eu x Ga 1-x) 2 O 3 thin films were deposited on sapphire substrates
by pulsed laser deposition with varying Eu content from x= 2.4 to 20 mol%. The optical and …
by pulsed laser deposition with varying Eu content from x= 2.4 to 20 mol%. The optical and …
Eu3+ reduction and efficient light emission in Eu2O3 films deposited on Si substrates
A stable Eu^ 3+? Eu^ 2+ reduction is accomplished by thermal annealing in N_2 ambient of
Eu_2O_3 films deposited by magnetron sputtering on Si substrates. Transmission electron …
Eu_2O_3 films deposited by magnetron sputtering on Si substrates. Transmission electron …
New strategies to improve the luminescence efficiency of Eu ions embedded in Si-based matrices
The comparison of the performances of SiO 2 and SiOC layers as host matrices for optically
active Eu ions is presented. A SiO 2 matrix allows to observe light emission from both Eu 2+ …
active Eu ions is presented. A SiO 2 matrix allows to observe light emission from both Eu 2+ …
SiOC thin films: an efficient light source and an ideal host matrix for Eu2+ ions
The intense luminescence of SiOC layers is studied and its dependence on the parameters
of the thermal annealing process elucidated. Although the emission of SiOC is bright …
of the thermal annealing process elucidated. Although the emission of SiOC is bright …
Green electroluminescence from Tb4O7 films on silicon: Impact excitation of Tb3+ ions by hot carriers
C Zhu, C Lv, M Jiang, J Zhou, D Li, X Ma… - Applied Physics …, 2016 - pubs.aip.org
We report on green electroluminescence (EL) due to the intra-4f transitions of the trivalent
terbium (Tb 3+) ions inherent in a Tb 4 O 7 film that is sandwiched between the ITO film and …
terbium (Tb 3+) ions inherent in a Tb 4 O 7 film that is sandwiched between the ITO film and …
[HTML][HTML] Structural and luminescence properties of Eu-doped PMO films with ethylene bridge and methyl terminal groups
Eu-doped periodic mesoporous organosilicate (PMO) films with terminal methyl and
ethylene bridging groups have been synthesized using sol-gel technology and spin-coating …
ethylene bridging groups have been synthesized using sol-gel technology and spin-coating …
[SÁCH][B] Rare-earth implanted MOS devices for silicon photonics: microstructural, electrical and optoelectronic properties
L Rebohle, W Skorupa - 2010 - books.google.com
Page 1 L. Rebohle W. Skorupa SPRINGER SERIES IN MATERIALS SCIENCE 142 Rare-Earth
Implanted MOS Devices for Silicon Photonics Microstructural, Electrical and Optoelectronic …
Implanted MOS Devices for Silicon Photonics Microstructural, Electrical and Optoelectronic …