Germanium based photonic components toward a full silicon/germanium photonic platform

V Reboud, A Gassenq, JM Hartmann, J Widiez… - Progress in Crystal …, 2017 - Elsevier
Lately, germanium based materials attract a lot of interest as they can overcome some limits
inherent to standard Silicon Photonics devices and can be used notably in Mid-Infra-Red …

Monolithic integration of InSb photodetector on silicon for mid-infrared silicon photonics

BW Jia, KH Tan, WK Loke, S Wicaksono, KH Lee… - ACS …, 2018 - ACS Publications
The InSb photodetector on a Si substrate acts as a signal receiver for the mid-infrared silicon
photonics application to overcome the limitation of group IV semiconductors. In this paper …

Design, theoretical, and experimental investigation of tensile-strained germanium quantum-well laser structure

MK Hudait, F Murphy-Armando… - ACS Applied …, 2021 - ACS Publications
Strain and band gap engineered epitaxial germanium (ε-Ge) quantum-well (QW) laser
structures were investigated on GaAs substrates theoretically and experimentally for the first …

High carrier lifetimes in epitaxial germanium–tin/Al (In) As heterostructures with variable tin compositions

MK Hudait, SW Johnston, MB Clavel… - Journal of Materials …, 2022 - pubs.rsc.org
Group IV-based germanium–tin (Ge1− ySny) compositional materials have recently shown
great promise for infrared detection, light emission and ultra-low power transistors. High …

Raman-strain relations in highly strained Ge: Uniaxial⟨ 100⟩,⟨ 110⟩ and biaxial (001) stress

A Gassenq, S Tardif, K Guilloy, I Duchemin… - Journal of Applied …, 2017 - pubs.aip.org
The application of high values of strain to Ge considerably improves its light emission
properties and can even turn it into a direct band gap semiconductor. Raman spectroscopy …

Map** the Ge/InAl (Ga) As interfacial electronic structure and strain relief mechanism in germanium quantum dots

MK Hudait, S Bhattacharya, S Karthikeyan… - Journal of Materials …, 2024 - pubs.rsc.org
Tensile-strained germanium (ε-Ge) has attracted significant interest due to its unique
properties in emerging optoelectronic devices. High tensile-strained Ge materials with …

Interplay Between Strain and Thickness on the Effective Carrier Lifetime of Buffer-Mediated Epitaxial Germanium Probed by the Photoconductance Decay Technique

S Bhattacharya, SW Johnston, S Datta… - ACS Applied …, 2023 - ACS Publications
We report contactless effective minority carrier lifetime of epitaxially grown unstrained and in-
plane< 110> biaxially tensile-strained (001) germanium (ε-Ge) epilayers measured using …

Monolithically Integrated -Ge/InxGa1-xAs Quantum Well Laser Design: Experimental and Theoretical Investigation

R Joshi, S Johnston, S Karthikeyan… - IEEE Journal of …, 2023 - ieeexplore.ieee.org
Here, we have analyzed the electrical and optical phenomenon occurring in a ϵ-Ge/In x Ga
1-x As quantum well (QW) laser through self-consistent physical solvers calibrated using in …

Atomic layer deposited tantalum silicate on crystallographically-oriented epitaxial germanium: interface chemistry and band alignment

MB Clavel, S Bhattacharya, MK Hudait - Materials Advances, 2022 - pubs.rsc.org
The interface chemistry and energy band alignment properties of atomic layer deposited
(ALD) tantalum silicate (TaSiOx) dielectrics on crystallographically-oriented, epitaxial (001) …

Direct and indirect band gaps in Ge under biaxial tensile strain investigated by photoluminescence and photoreflectance studies

D Saladukha, MB Clavel, F Murphy-Armando… - Physical Review B, 2018 - APS
Germanium is an indirect semiconductor which attracts particular interest as an electronics
and photonics material due to low indirect-to-direct band separation. In this work we bend …