Noise and Defects in Microelectronic Materials and Devices

DM Fleetwood - IEEE Transactions on Nuclear Science, 2015 - ieeexplore.ieee.org
This paper reviews and compares predictions of the Dutta-Horn model of low-frequency
excess (1/f) noise with experimental results for thin metal films, MOS transistors, and …

Border traps in Ge/III–V channel devices: Analysis and reliability aspects

E Simoen, DHC Lin, A Alian… - … on Device and …, 2013 - ieeexplore.ieee.org
The aim of this review paper is to describe the impact of so-called border traps (BTs) in high-
k gate oxides on the operation and reliability of high-mobility channel transistors. First, a …

[KİTAP][B] RF and microwave transistor oscillator design

A Grebennikov - 2007 - books.google.com
The increase of consumer electronics and communications applications using Radio
Frequency (RF) and microwave circuits has implications for oscillator design. Applications …

Current crowding mediated large contact noise in graphene field-effect transistors

P Karnatak, TP Sai, S Goswami, S Ghatak… - Nature …, 2016 - nature.com
The impact of the intrinsic time-dependent fluctuations in the electrical resistance at the
graphene–metal interface or the contact noise, on the performance of graphene field-effect …

Front-end ASIC for a Liquid Argon TPC

G De Geronimo, A D'Andragora, S Li… - … & Medical Imaging …, 2010 - ieeexplore.ieee.org
We introduce a front-end application specific integrated circuit (ASIC) for a wire based Time-
Projection-Chamber (TPC) operating in liquid Argon (LAr). The LAr TPC will be used for long …

On the oxide trap density and profiles of 1-nm EOT metal-gate last CMOS transistors assessed by low-frequency noise

E Simoen, A Veloso, Y Higuchi… - IEEE transactions on …, 2013 - ieeexplore.ieee.org
The low-frequency noise behavior of replacement metal gate high-k/metal-gate MOSFETs
with an equivalent oxide thickness of the SiO 2/HfO 2 bilayer in the range~ 1 nm has been …

Single trap dynamics in electrolyte-gated Si-nanowire field effect transistors

S Pud, F Gasparyan, M Petrychuk, J Li… - Journal of applied …, 2014 - pubs.aip.org
Liquid-gated silicon nanowire (NW) field effect transistors (FETs) are fabricated and their
transport and dynamic properties are investigated experimentally and theoretically. Random …

Effects of gate oxide and junction nonuniformity on the DC and low-frequency noise performance of four-gate transistors

JAJ Tejada, AL Rodríguez, A Godoy… - IEEE transactions on …, 2011 - ieeexplore.ieee.org
The effects of imperfections on the electrical performance of four-gate field-effect transistors
(G4-FETs) have been studied. Variations in the oxide trap distribution and in the …

Statistical noise analysis of CMOS image sensors in dark condition

JM Woo, HH Park, SM Hong, IY Chung… - … on electron devices, 2009 - ieeexplore.ieee.org
The statistical noise analysis of the CMOS image sensors in the dark condition has been
performed with a newly developed 3-D technology computer-aided design framework. The …

Low-frequency noise assessment of border traps in Al2O3 capped DRAM peripheral MOSFETs

E Simoen, A Federico, M Aoulaiche… - Semiconductor …, 2014 - iopscience.iop.org
Low-frequency noise has been used to study the impact of an Al 2 O 3 work-function-
engineering cap layer on the gate oxide quality of SiO 2/HfO 2 DRAM peripheral n-and …