Si–Ge–Sn alloys: From growth to applications
In this review article, we address key material parameters as well as the fabrication and
application of crystalline GeSn binary and SiGeSn ternary alloys. Here, the transition from an …
application of crystalline GeSn binary and SiGeSn ternary alloys. Here, the transition from an …
Spin transport and relaxation in germanium
K Hamaya, Y Fujita, M Yamada… - Journal of Physics D …, 2018 - iopscience.iop.org
This paper reviews the recent progress in germanium (Ge) spintronics on the basis of the
electrical spin injection from ferromagnets (FM), where Ge is a next generation …
electrical spin injection from ferromagnets (FM), where Ge is a next generation …
Optically pumped GeSn micro-disks with 16% Sn lasing at 3.1 μm up to 180 K
V Reboud, A Gassenq, N Pauc, J Aubin… - Applied Physics …, 2017 - pubs.aip.org
Recent demonstrations of optically pumped lasers based on GeSn alloys put forward the
prospect of efficient laser sources monolithically integrated on a Si photonic platform. For …
prospect of efficient laser sources monolithically integrated on a Si photonic platform. For …
Metal-induced layer exchange of group IV materials
K Toko, T Suemasu - Journal of Physics D: Applied Physics, 2020 - iopscience.iop.org
Layer exchange (LE) is an interesting phenomenon in which metal and semiconductor
layers exchange during heat treatment. A great deal of effort has been put into research on …
layers exchange during heat treatment. A great deal of effort has been put into research on …
Atomically uniform Sn-rich GeSn semiconductors with 3.0–3.5 μm room-temperature optical emission
The simultaneous control of lattice strain, composition, and microstructure is crucial to
establish high-quality, direct bandgap GeSn semiconductors. Herein, we demonstrate that …
establish high-quality, direct bandgap GeSn semiconductors. Herein, we demonstrate that …
Progress on germanium–tin nanoscale alloys
Group IV alloys have attracted interest in the drive to create Si compatible, direct band gap
materials for implementation in complementary metal oxide semiconductor (CMOS) and …
materials for implementation in complementary metal oxide semiconductor (CMOS) and …
Improving carrier mobility of polycrystalline Ge by Sn do**
To improve the performance of electronic devices, extensive research efforts have recently
focused on the effect of incorporating Sn into Ge. In the present work, we investigate how Sn …
focused on the effect of incorporating Sn into Ge. In the present work, we investigate how Sn …
[HTML][HTML] Germanium microlasers on metallic pedestals
Strain engineering is a powerful approach in micro-and optoelectronics to enhance carrier
mobility, tune the bandgap of heterostructures, or break lattice symmetry for nonlinear optics …
mobility, tune the bandgap of heterostructures, or break lattice symmetry for nonlinear optics …
Material gain engineering in GeSn/Ge quantum wells integrated with an Si platform
It is shown that compressively strained Ge1− xSnx/Ge quantum wells (QWs) grown on a Ge
substrate with 0.1≤ x≤ 0.2 and width of 8 nm≤ d≤ 14 nm are a very promising gain …
substrate with 0.1≤ x≤ 0.2 and width of 8 nm≤ d≤ 14 nm are a very promising gain …
GaAs/GeSn/Ge n–i–p diodes and light emitting diodes formed via grafting
Germanium-tin (GeSn) is a promising semiconductor material for future optoelectronic
devices operating at the near-infrared to mid-infrared spectral range. In this work, we report …
devices operating at the near-infrared to mid-infrared spectral range. In this work, we report …