Impact of strain engineering and Sn content on GeSn heterostructured nanomaterials for nanoelectronics and photonic devices
Heterostructures based on the GeSn nanocompound have high impact on integrated
photonics devices. The promising feature of GeSn nanostructures is its direct bandgap …
photonics devices. The promising feature of GeSn nanostructures is its direct bandgap …
Review of Ge (GeSn) and InGaAs avalanche diodes operating in the SWIR spectral region
Y Miao, H Lin, B Li, T Dong, C He, J Du, X Zhao, Z Zhou… - Nanomaterials, 2023 - mdpi.com
Among photodetectors, avalanche photodiodes (APDs) have an important place due to their
excellent sensitivity to light. APDs transform photons into electrons and then multiply the …
excellent sensitivity to light. APDs transform photons into electrons and then multiply the …
Manufacture and study CdTe/Ge/Si of broadband ultraviolet–visible photodetector
In this work, a CdTe/Ge/Si photodetector was fabricated using two different methods. The
thermal evaporation method was used to prepare Ge on n-type silicon substrates, and then …
thermal evaporation method was used to prepare Ge on n-type silicon substrates, and then …
High performance junctionless FDSOI SiGe channel p-FinFET with high ION/IOFF ratio and excellent SS
H Lin, X Zhao, X Luo, Y Miao, Y Zhang, Z Kong… - Materials Science in …, 2024 - Elsevier
This paper presents a novel FDSOI FinFETs with SiGe channel/Si cap layer (35 nm/5 nm)
formed on SOI wafers with 20 nm Si body. Electrical characterization result shows that JL …
formed on SOI wafers with 20 nm Si body. Electrical characterization result shows that JL …
Influence of synthesis method and processing on the thermoelectric properties of CoSb3 skutterudites
In the present work, single phase CoSb3 skutterudite nanomaterials were prepared via a
ball milling method, and their thermoelectric characteristics were compared with the samples …
ball milling method, and their thermoelectric characteristics were compared with the samples …
Reduced dislocation of GaAs layer grown on Ge-buffered Si (001) substrate using dislocation filter layers for an O-band InAs/GaAs quantum dot narrow-ridge laser
Y Du, W Wei, B Xu, G Wang, B Li, Y Miao, X Zhao… - Micromachines, 2022 - mdpi.com
The development of the low dislocation density of the Si-based GaAs buffer is considered
the key technical route for realizing InAs/GaAs quantum dot lasers for photonic integrated …
the key technical route for realizing InAs/GaAs quantum dot lasers for photonic integrated …
Mid-Infrared Photodetectors-based on Lattice Matched SiGeSn/GeSn Heterojunction Bipolar Transistor with an i-GeSn Absorber Layer
This work proposes a high-performance lattice-matched SiGeSn/GeSn/SiGeSn
heterojunction bipolar phototransistors (HPTs) and pin photodiodes grown on strain-free …
heterojunction bipolar phototransistors (HPTs) and pin photodiodes grown on strain-free …
High-Performance Ge PIN Photodiodes on a 200 mm Insulator with a Resonant Cavity Structure and Monolayer Graphene Absorber for SWIR Detection
J Yu, X Zhao, Y Miao, J Su, Z Kong, H Li… - ACS Applied Nano …, 2024 - ACS Publications
High-responsivity and low dark current resonant-cavity-enhanced (RCE) Ge PIN
photodiodes with a monolayer graphene absorber were demonstrated on a 200 mm …
photodiodes with a monolayer graphene absorber were demonstrated on a 200 mm …
Lateral GeSn waveguide-based homojunction phototransistor for next-generation 2000 nm communication and sensing applications
This work reports a novel mid-infrared lateral Ge 1− x Sn x (x= 6%) waveguide (WG)-based
phototransistors (PTs) on a silicon platform. A lateral device structure is proposed to …
phototransistors (PTs) on a silicon platform. A lateral device structure is proposed to …
Growth of single-crystalline GeSn films with high-Sn content on InP substrates by sputtering and rapid thermal annealing
C Tan, S Ke, J Lv, Y Huang, D Peng, Z Duan… - Applied Surface …, 2024 - Elsevier
In this work, the polycrystalline GeSn film with Sn content of 25.3% on InP is obtained by
sputtering at room temperature and then rapid thermal annealing (RTA) at 300℃. The single …
sputtering at room temperature and then rapid thermal annealing (RTA) at 300℃. The single …